Rotating magnetic field configuration for controlled particle flux in material processing applications
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Shail Pandey
,
Akash Agarwal
Abstract
Plasma technology has been an integral part of the semiconductor industries, especially to achieve the desired etch and selectivity of the outcome. These outcomes depend on various factors including the confinement of the charged particles of the plasma source. One of the widely employed confinement schemes is the multipole arrangement of magnetic fields, also known as a multicusp. Such arrangement provides minimum-B field value near the plasma axis and plays significant role in plasma-based ion sources for material processing and in plasma thrusters for spacecraft applications. In the present work, a novel rotating multicusp about its axis is studied to investigate its effect on the confinement of electrons present within it. The multicusp is allowed to rotate with a finite rotational speed, in the range of 0–107 rotation per second, thus inducing an axial electric field. It will lead to a directed axial flux of the electrons, determined by the rotational speed of the multicusp. The dynamics of the electrons enclosed within a rotating multicusp have been studied to explore its radial confinement. The results are of significance for semiconductor industries and others where downstream or afterglow plasmas are utilized for material applications.
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Author contributions: All the authors have accepted responsibility for the entire content of this submitted manuscript and approved submission.
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Research funding: The authors (S.P. and D.J.) would like to acknowledge DST INSPIRE Faculty grant (DST/INSPIRE Faculty Award/2016/DST/INSPIRE/04/2015/001698), Institute Seed grant (Dean (R&C)/2020-2021/1155, 2020-2021/Seed Money/18) and the Office of the Principal Scientific Adviser, Government of India for their support in the present research work.
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Conflict of interest statement: The authors declare that they have no conflicts of interest to this work. We declare that we do not have any commercial or associative interest that represents a conflict of interest in connection with the work submitted.
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