Startseite Microstructure and phase formation of Heusler thin film compounds
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Microstructure and phase formation of Heusler thin film compounds

  • Jürgen Thomas EMAIL logo , Joachim Schumann , Maria Dománková und Thomas Gemming
Veröffentlicht/Copyright: 16. Februar 2022
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Abstract

Heusler compounds are promising materials to be applied effectively as highly spin-polarized medium (or components) in spintronic devices. To prove their chances the microstructure, the phase formation, and the chemical homogeneity of sputtered thin films of Co2MnSi and Co2Cr0.6Fe0.4Al were studied by in-situ TEM observations as well as by analytical characterizations. The observed grain growth and phase formation in dependence on temperature agrees well with the results of measurements of the film resistivity. The chemical homogeneity varies and depends on the deposition process during thin film preparation, especially the incorporation of oxygen is an unwanted effect.


Dr. Jürgen Thomas IFW Dresden, Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden PF 27 01 16, D-01171 Dresden, Germany Tel.: +49 351 4659 250 Fax: +49 351 4659 452

Dedicated to Professor Dr. Dr. h. c. Klaus Wetzig on the occasion of his 65th birthday


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Received: 2005-04-15
Accepted: 2005-06-14
Published Online: 2022-02-16

© 2005 Carl Hanser Verlag, München

Artikel in diesem Heft

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  2. Kösterpreis
  3. Award/Preisverleihung
  4. Editorial
  5. Editorial
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