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Application of factor analysis in electron spectrometry (AES, XPS) for materials science

  • Stefan Baunack EMAIL logo und Steffen Oswald
Veröffentlicht/Copyright: 16. Februar 2022
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Abstract

Electron spectroscopic methods as X-ray photoelectron spectrometry (XPS) and Auger electron spectrometry (AES) are well established in the field of thin-film and surface analysis. In the measured spectral information, always also chemical information on the sample is contained. It is discussed that often chemometrical methods are the only way to extract such (hidden) information from the measured data sets. We demonstrate for AES and XPS measurements, how factor analysis (FA) can help to derive chemical information at Ti-based material developed for body implants. An introduction to the methodology is given, and challenges and restrictions are discussed.


Dr. Stefan Baunack IFW Dresden, Leibniz-Institut für Festkörper- und Werkstoffforschung Dresden Postfach 27 01 16, D-01171 Dresden, Germany Tel.: +49 351 4659 387 Fax: +49 351 4659 452

Dedicated to Professor Dr. Dr. h. c. Klaus Wetzig on the occasion of his 65th birthday


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Received: 2005-04-18
Accepted: 2005-06-21
Published Online: 2022-02-16

© 2005 Carl Hanser Verlag, München

Artikel in diesem Heft

  1. Frontmatter
  2. Kösterpreis
  3. Award/Preisverleihung
  4. Editorial
  5. Editorial
  6. Articles Basic
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  14. A comparison of thermal stability in nanocrystalline Ni- and Co-based materials
  15. Microstructure and phase formation of Heusler thin film compounds
  16. Correlation between the average composition of coherent superlattice and the GMR properties of electrodeposited Co–Cu/Cu multilayers
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  19. Modeling of axial strain in free-end torsion of textured copper
  20. Vacancies in plastically deformed copper
  21. An analytic and generalized formulation of the sin2 ψ-method
  22. Nanoindentation applied on a tungsten–copper composite before and after high-pressure torsion
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  28. Notifications/Mitteilungen
  29. Personal
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