Chemical Product and Process Modeling
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Herausgegeben von:
Rahmat Sotudeh-Gharebagh
Über diese Zeitschrift
Objective
Chemical Product and Process Modeling (CPPM) is a quarterly journal that publishes theoretical and applied research on product and process design modeling, simulation and optimization. Thanks to its international editorial board, the journal assembles the best papers from around the world on to cover the gap between product and process. The journal brings together chemical and process engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Editors represent top engineering institutions across the globe, such as the University of Tehran, the Ecole Polytechnique de Montreal, Rutgers, Indian Institute of Technology, the Technical University Hamburg, Jordan University of Science and Technology, Dalhouse University, University Politehnica of Bucharest, University College London, Auburn University, Universidade do Minho, National University of Singapore, University of Paderborn, University of Lapeenranta, University of Pannonia, The City College of New York, Indian Institute of Technology Roorkee, Texas A&M University at Qatar, Texas A&M University at Qatar, Politecnico of Milano, University of Wollongong, Norwegian University of Science and Technology, CANMET Energy Technology Centre, University of Saskatchewan, Universitat Politecnica de Catalunya, Ecole Nationale Supérieure en Génie des Technologies Industrielles, ENSGTI, University of Western Ontario, Aristotle University of Thessaloniki and Centre for Research and Technology, IFP Energies nouvelles, University of Calgary, Abo Akademi University, Technical University Hamburg, University of Auckland, UCLA School of Public Health and the University of Buenos Aires.
- equation oriented and modular simulation
- optimization technology for process and materials design, new modeling techniques
- shortcut modeling and design approaches
- performance of commercial and in-house simulation and optimization tools
- challenges faced in industrial product and process simulation and optimization
- computational fluid dynamics
- environmental process, food and pharmaceutical modeling
- topics drawn from the substantial areas of overlap between modeling and mathematics applied to chemical products and processes
Editorial Notes, Research Articles, Reviews
Ihre Vorteile
- the premier forum for research on product and process design modeling and simulation
- theoretical and applied approach to the subject-matter
- the best papers from around the world on modern modeling, design, simulation and optimization techniques
- international editorial board
Geschichte
Content available since 2006 (Volume 1, Issue 1)
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Heft 2Special Issue in Honor of Professor Eugeny Kenig; Guest Editor: Ulf Brinkmann and Mark Piper
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Heft 2Special Issue in Honor of Professor Faïçal Larachi; Guest Editor: Professor Safia Hamoudi
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Heft 4Special Issue: CPPM special issue in honour of Professor W.Y. “Bill” Svrcek; Guest Editors: Brent R. Young and Ramin Bozorgmehry
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Heft 2Special Issue: CHEM-CONFLUX²⁰; Guest Editors: Dipesh S. Patle, Reza Zarghami and Sushil Kumar
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Heft 4Special Issue of 29th Symposium of Malaysian Chemical Engineers (SOMChE) 2016 - Process System Engineering, Guest Editors: Agus Saptoro, Jobrun Nandong, Mohd Azlan Bin Hussain, Syamsul Rizal Abd. Shukor
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Journal Impact Factor | 1.3 | 2024, Journal Citation Reports (Clarivate, 2025) |
5-year Journal Impact Factor | 1.1 | 2024, Journal Citation Reports (Clarivate, 2025) |
Journal Citation Indicator | 0.17 | 2024, Journal Citation Reports (Clarivate, 2025) |
CiteScore | 2.2 | 2024, Scopus (Elsevier B.V., 2025) |
SCImago Journal Rank | 0.257 | 2024, SJR (Scimago Lab, 2025; Data Source: Scopus) |
Source Normalized Impact per Paper | 0.514 | 2024, CWTS Journal Indicators (CWTS B.V., 2025; Data Source: Scopus) |
Submission
You can easily submit your manuscript online. Simply go to...
http://mc.manuscriptcentral.com/dgcppm
...and you will be guided through the whole peer-reviewing and publishing process.
- Ahead-of-print, online publication with short turnaround times
- High quality manuscript processing through ScholarOne Manuscripts®
- Optional open access publication
- Accepted papers will be published online first as DOI-citable, forward-linked articles for quickest possible visibility for the scientific community
- Every article easily discoverable because of Search Engine Optimization (SEO) and comprehensive abstracting and indexing services
- Secure archiving by De Gruyter and the independent archiving service Portico
- Professional sales and marketing activities
Submission process
- Before preparing a manuscript please have a look at our Instruction for Authors
- Submission of your paper via our submission management tool
- Peer review process (you will be guided through every step)
- If accepted: you have the option to publish it open access
- We encourage software developers and other practitioners to submit articles on specific topics to the journal
- Articles published in CPPM must be of the highest scientific quality and originality. They are expected to be widely read and cited by all interested researchers and engineers in the field of chemical process and product simulation who, in turn, will have immediate access to high quality and relevant articles in their area
- Manuscripts must be written in clear and concise English
- Before submitting your article please have a look at our Ethical Guidelines and our Copyright Transfer Agreement
- Once your article is accepted you have the option to publish it open access
- Our Repository Policy allows you to distribute 30 PDF copies of your published article to colleagues (the PDF has to include the information that it is an author's copy). Please also feel free to distribute the link to the online abstract
- If you have any general questions please visit our FAQ page for authors or contact us at: cppm@degruyter.com
We look forward to receiving your manuscript!
Open Access
In this journal, authors have the option to publish their article under an open access license. Open access allows you as an author to retain copyright and share your findings with colleagues and interested parties worldwide without any restraints. Each article published under an open access license is subject to an Article Processing Charge of €2300.
Editorial Board
Jamal Chaouki, Ecole Polytechnique de Montreal, Canada, jamal.chaouki@polymtl.ca
Navid Mostoufi, University of Tehran, Iran, mostoufi@ut.ac.ir
Rahmat Sotudeh-Gharebagh, University of Tehran, Iran sotudeh@ut.ac.ir, cppm@degruyter.com
Associate Editors
Thomas A. Adams II, McMaster University, Canada tadams@mcmaster.ca
Mohd Azlan Bin Hussain, University of Malaya, Malaysia mohd_azlan@um.edu.my
Diego Barletta, Università di Salerno, Italy, dbarletta@unisa.it
Miryan Cassanello, Universidad de Buenos Aires, Argentina miryan@di.fcen.uba.ar
Mario R. Eden, Auburn University, USA edenmar@auburn.edu
Eugénio C. Ferreira, Universidade do Minho, Portugal ecferreira@deb.uminho.pt
Iftikhar Karimi, National University of Singapore, Singapore cheiak@nus.edu.sg
Eugeny Kenig, Paderborn University, Germany eugeny.kenig@upb.de
Surendra Kumar, Indian Institute of Technology Roorkee, India skumar@iitr.ac.in
Roberto Lemus-Mondaca, Universidad de Chile, rlemus@uchile.cl
Patrick Linke, Texas A&M University at Qatar, Qatar patrick.linke@qatar.tamu.edu
Iqbal Mujtaba, University of Bradford, UK, I.M.Mujtaba@bradford.ac.uk
Mark Nelson, University of Wollongong, Australia mnelson@uow.edu.au
Fernando Preto, CANMET Energy Technology Centre, Canada preto@nrcan.gc.ca
Luis Puigjaner, Universitat Politecnica de Catalunya, Spain luis.puigjaner@upc.edu
Seshagiri Rao Ambati, Indian Institute of Petroleum and Energy (IIPE), India; seshagiri.che@iipe.ac.in
Jean-Michel Reneaume, Ecole Nationale Supérieure en Génie des Technologies Industrielles, ENSGTI, France jean-michel.reneaume@univ-pau.fr
Bill Svrcek, University of Calgary, Canada svrcek@ucalgary.ca
Jan Verstraete, IFP Energies nouvelles, France jan.verstraete@ifp.fr
Brent Young, University of Auckland, New Zealand b.young@auckland.ac.nz
Reza Zarghami, University of Tehran, Iran, rzarghami@ut.ac.ir
Edwin Zondervan, University of Twente, The Netherlands, e.zondervan@utwente.nl
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