Imaging optics on scanner for SMO generation process
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Tomoyuki Matsuyama
Tomoyuki Matsuyama received a BS in applied physics from the University of Electro-Communications (Japan) in 1989. In the same year he joined Nikon Corporation. He has been working in the area of optical design and manufacturing technology development for microlithographic lens. Recently, he is working for development of application software for the imaging system of lithography exposure tool. He is currently a Manager of Imaging Solutions Section, Precision Equipment Company.
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Yasushi Mizuno
Yasushi Mizuno received a BS in mechanical engineering from Tokyo University of Science in 1996 and MS of mechanical engineering from the same university in 1998. In the same year he joined Nikon Corporation in Japan. He is a senior system designer for imaging system of the exposure tool. He is now working for the illumination system development for state-of-the-art ArF immersion scanner.
Daniel G. Smith received his PhD from the Optical Sciences Center and has been working as an optical designer in the field of Microlithography at Nikon Research Corporation of America since 2004.
©2012 by Walter de Gruyter Berlin Boston
Artikel in diesem Heft
- Masthead
- Masthead
- Editorial
- The Next Decade of Optical Lithography
- Views
- ITRS lithography roadmap: status and challenges
- Community
- News from The European Optical Society
- Conference Notes
- Conference Calendar
- Topical Issue: The Next Decade of Optical Lithography
- Tutorial
- Calculation and uses of the lithographic aerial image
- Review Articles
- Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization
- Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation
- Advances in EUV light sources
- Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
- Research Articles
- Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair
- Imaging optics on scanner for SMO generation process
- Tutorial
- Practical aspects of modern interferometry for optical manufacturing quality control, Part 3
Artikel in diesem Heft
- Masthead
- Masthead
- Editorial
- The Next Decade of Optical Lithography
- Views
- ITRS lithography roadmap: status and challenges
- Community
- News from The European Optical Society
- Conference Notes
- Conference Calendar
- Topical Issue: The Next Decade of Optical Lithography
- Tutorial
- Calculation and uses of the lithographic aerial image
- Review Articles
- Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization
- Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation
- Advances in EUV light sources
- Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
- Research Articles
- Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair
- Imaging optics on scanner for SMO generation process
- Tutorial
- Practical aspects of modern interferometry for optical manufacturing quality control, Part 3
