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Practical aspects of modern interferometry for optical manufacturing quality control, Part 3

  • Robert A. Smythe

    Robert Smythe has over 30 years experience in the field of interferometry. Beginning at Corning Tropel, he developed displacement measuring interferometers and interferometers to measure glass homogeneity and surface form. He then moved to the Zygo Corporation and for over 20 years created interferometer-based products to measure surface finish, waviness, and form for markets ranging from semiconductor lithography optical systems to automotive engine components. Besides development engineering, Robert also led marketing and sales at Zygo gaining insight into the practical application of interferometers in diverse applications. He now operates a consulting business aimed at product creation, development and application, and global marketing of high technology products, primarily optical-based metrology systems.

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Published/Copyright: September 8, 2012
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Advanced Optical Technologies
From the journal Advanced Optical Technologies Volume 1 Issue 4

Received: 2012-6-28
Accepted: 2012-8-1
Published Online: 2012-09-08
Published in Print: 2012-09-01

©2012 by Walter de Gruyter Berlin Boston

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https://doi.org/10.1515/aot-2012-0031
Keywords for this article
cloud computing; interferometer; Internet of Things; partial coherence

Articles in the same Issue

  1. Masthead
  2. Masthead
  3. Editorial
  4. The Next Decade of Optical Lithography
  5. Views
  6. ITRS lithography roadmap: status and challenges
  7. Community
  8. News from The European Optical Society
  9. Conference Notes
  10. Conference Calendar
  11. Topical Issue: The Next Decade of Optical Lithography
  12. Tutorial
  13. Calculation and uses of the lithographic aerial image
  14. Review Articles
  15. Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization
  16. Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation
  17. Advances in EUV light sources
  18. Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
  19. Research Articles
  20. Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair
  21. Imaging optics on scanner for SMO generation process
  22. Tutorial
  23. Practical aspects of modern interferometry for optical manufacturing quality control, Part 3
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