Advances in EUV light sources

Nigel R. Farrar; Bruno M. La Fontaine; Igor V. Fomenkov; David C. Brandt

doi:10.1515/aot-2012-0125

Article Publicly Available

Advances in EUV light sources

Nigel R. Farrar
Nigel R. Farrar is the Vice President of Lithography Applications at Cymer, Inc., and is a member of its Scientific Advisory Board. He joined Cymer in 1999 and has led activities to identify the critical performance factors for the light source in the microlithography process. Prior to joining Cymer, he spent 15 years at Hewlett Packard working on advanced microlithography technologies. He has authored over 40 technical papers in the field of microlithography process technology. He holds BS and PhD degrees in Physics from the University of Bristol in England.
, Bruno M. La Fontaine
Bruno LaFontaine has served as the senior director of global EUV lithography applications at Cymer, Inc. since February 2010, where he is responsible for leading the application development for the company’s laser produced plasma (LPP) EUV light sources. Involved in the EUV lithography industry since 1992, LaFontaine brings to Cymer nearly a decade of expertise in EUV, light sources, physics and optics. Prior to joining Cymer, LaFontaine held fellow of lithography positions, first at Advanced Micro Devices (AMD) and later at GLOBALFOUNDRIES. Before AMD, LaFontaine held roles at the Lawrence Livermore National Laboratory and Bell Laboratories. Since 2007, LaFontaine has served as conference chair for SPIE, the international society for optics and photonics. He received his bachelor’s degree in physics from the Université de Montréal and his masters and doctorate in physics from the Institut National de la Recherche Scientifique.
, Igor V. Fomenkov
Igor V. Fomenkov graduated and received his PhD in Physics and Mathematics from the Moscow Institute of Physics and Technology in 1981 and 1986, respectively. He worked as a senior scientist at the Institute of General Physics. His research was conducted in areas of interaction of laser radiation with matter and plasma diagnostics. Since 1992, he has been with Cymer Inc., currently as Fellow, working on research and development of excimer lasers and EUV light sources for microlithography applications.
and David C. Brandt
David Brandt serves as Senior Director of EUV Marketing with nearly two decades of experience in engineering, product development, and marketing. Before leading the program and marketing activities within the EUV development group, Brandt spent the last decade filling several critical roles at Cymer – from managing the company’s international subsidiaries in Taiwan and Korea during the launch of DUV technology in 1996–1997, to leading Cymer’s product marketing group from 1998 to 2001, researching new growth markets in the business development group in 2002, to managing chipmaker customers in the worldwide regional marketing group in 2003–2004. Prior to his appointment at Cymer, Brandt managed the engineering development, product design, and continuous product improvement activities of Chemical Vapor Deposition (CVD) systems for Watkins-Johnson. Upon the successful launch of their high-volume product, Brandt led the creation of the company’s product marketing group. Brandt holds a bachelor’s in Mechanical Engineering degree from California Polytechnic State University in San Luis Obispo, California.