Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
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Anthony Garetto
Anthony Garetto received his BS in Physics from the Applachian State University and his Masters from North Carolina State University in Materials Science and Engineering. Since his employment with Carl Zeiss in 2006 he has held the positions of Applications Specialist and Applications Supervisor. Currently he is the Product Manager for AIMS EUV.
Thomas Scherübl received a diploma in Physics from the University of Heidelberg, Germany and a PhD in Materials Science from the Technical University of Berlin. He joined Carl Zeiss in 1996. Since then he has held various positions as project manager and R&D manager for inspection and metrology systems for the semiconductor industry. Currently, he is the Director of Product Management and Application at Carl Zeiss Semiconductor Metrology Systems (Carl Zeiss SMS).
and
Jan Hendrik Peters
Jan Hendrik Peters studied physics at the University of Hamburg, Germany, and University of Washington, Seattle. He received his PhD in particle physics in 1990. Until 2003 he worked at the Deutsches Elektronen-Synchrotron DESY research center in Hamburg. After receiving an MBA from the Nordakademie in Elmshorn in 2003, he moved to Dresden to work as R&D manager for future mask development at the Advanced Mask Technology Center, Dresden, including 157 nm, 193 immersion lithography and double patterning, as well as EUV technologies. He has led several national and international funded projects in these fields. Since 2010 he coordinates the mask related EUV activities of Carl Zeiss SMS and currently holds the position of the Director New Business Development.
©2012 by Walter de Gruyter Berlin Boston
Articles in the same Issue
- Masthead
- Masthead
- Editorial
- The Next Decade of Optical Lithography
- Views
- ITRS lithography roadmap: status and challenges
- Community
- News from The European Optical Society
- Conference Notes
- Conference Calendar
- Topical Issue: The Next Decade of Optical Lithography
- Tutorial
- Calculation and uses of the lithographic aerial image
- Review Articles
- Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization
- Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation
- Advances in EUV light sources
- Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
- Research Articles
- Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair
- Imaging optics on scanner for SMO generation process
- Tutorial
- Practical aspects of modern interferometry for optical manufacturing quality control, Part 3
Articles in the same Issue
- Masthead
- Masthead
- Editorial
- The Next Decade of Optical Lithography
- Views
- ITRS lithography roadmap: status and challenges
- Community
- News from The European Optical Society
- Conference Notes
- Conference Calendar
- Topical Issue: The Next Decade of Optical Lithography
- Tutorial
- Calculation and uses of the lithographic aerial image
- Review Articles
- Review of computational lithography modeling: focusing on extending optical lithography and design-technology co-optimization
- Development of core technologies on EUV mask and resist for sub-20-nm half pitch generation
- Advances in EUV light sources
- Aerial imaging technology for photomask qualification: from a microscope to a metrology tool
- Research Articles
- Computational metrology and inspection (CMI) in mask inspection, metrology, review, and repair
- Imaging optics on scanner for SMO generation process
- Tutorial
- Practical aspects of modern interferometry for optical manufacturing quality control, Part 3
