Abstract
LaNi5 films were deposited on a nickel substrate using a La2Ni7 alloy target with a sputtering power, WS, of 50– 400 W at substrate temperature, TS, of 323–573 K by a radio frequency magnetron sputtering apparatus. The nickel content of the films decreased with increasing WS and increased with increasing TS. At low WS and low TS, amorphous films were deposited. In other conditions, the films were polycrystalline. The films deposited at high WS and low TS exhibited only a (hk · 0) peak in the X-ray diffraction profiles. This indicates that the c-axis of crystalline films was oriented parallel to the substrate plane. At high WS and high TS, the films with columnar structure were obtained. The hydrogen absorption capacity of the films increased with increasing WS. On the other hand, the equilibrium pressure of the films decreased with increasing WS. The films deposited at 400 W represented a pressure plateau on the pressure –composition isotherms.
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© 2001 Carl Hanser Verlag, München
Articles in the same Issue
- Frontmatter
- Editorial
- Dieter Neuschütz 65 Years
- Aufsätze/Articles
- Combinatorial Methods for Advanced Materials Research & Development
- Chemische Gasphasenabscheidung von SiC und SiC + Si auf Kohlenstoffsubstraten und ihre chemische Oberflächenmodifizierung
- Fabrication and Characterization of Hydrogen Absorption LaNi5 Alloy Films Sputtered on Nickel Substrate
- On the Importance of Gas Phase Chemistry in Two CVD Systems: Deposition of Silicon and Diamond
- Thermodynamic Prediction of Metastable Coating Structures in PVD Processes
- Setting Kinetic Controls for Complex Equilibrium Calculations
- Modeling of the Thermochemical Properties of Multicomponent Oxide Melts
- Subsolidus Phase Relationships of the β–Sialon Solid Solution in the Oxygen-Rich Part of the Nd–Si–Al–O–N System
- Investigation of Microstructure and Chemical Stability in Composites of NiAl Reinforced by Alumina-Silica Fibers
- Gesicherte Interpretationen der FTIR-Reflexionsspektren von SiC–CVD-Schichten durch Spektrensimulation
- Characterization of Cohesion, Adhesion and Creep-Properties of Dynamically Loaded Coatings through the Impact Tester
- Peculiarities of Diffusion Controlled Phase Formation in the Al–Co System
- Mitteilungen/Notifications
- Personen
- Bücher/Books
- Tagungen
Articles in the same Issue
- Frontmatter
- Editorial
- Dieter Neuschütz 65 Years
- Aufsätze/Articles
- Combinatorial Methods for Advanced Materials Research & Development
- Chemische Gasphasenabscheidung von SiC und SiC + Si auf Kohlenstoffsubstraten und ihre chemische Oberflächenmodifizierung
- Fabrication and Characterization of Hydrogen Absorption LaNi5 Alloy Films Sputtered on Nickel Substrate
- On the Importance of Gas Phase Chemistry in Two CVD Systems: Deposition of Silicon and Diamond
- Thermodynamic Prediction of Metastable Coating Structures in PVD Processes
- Setting Kinetic Controls for Complex Equilibrium Calculations
- Modeling of the Thermochemical Properties of Multicomponent Oxide Melts
- Subsolidus Phase Relationships of the β–Sialon Solid Solution in the Oxygen-Rich Part of the Nd–Si–Al–O–N System
- Investigation of Microstructure and Chemical Stability in Composites of NiAl Reinforced by Alumina-Silica Fibers
- Gesicherte Interpretationen der FTIR-Reflexionsspektren von SiC–CVD-Schichten durch Spektrensimulation
- Characterization of Cohesion, Adhesion and Creep-Properties of Dynamically Loaded Coatings through the Impact Tester
- Peculiarities of Diffusion Controlled Phase Formation in the Al–Co System
- Mitteilungen/Notifications
- Personen
- Bücher/Books
- Tagungen