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journal: Chemical Product and Process Modeling
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Chemical Product and Process Modeling

  • Edited by: Rahmat Sotudeh-Gharebagh , Navid Mostoufi and Jamal Chaouki
Language: English
First published: May 1, 2006
Publication Frequency: 6 issues per year
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About this journal

Objective
Chemical Product and Process Modeling (CPPM) is a quarterly journal that publishes theoretical and applied research on product and process design modeling, simulation and optimization. Thanks to its international editorial board, the journal assembles the best papers from around the world on to cover the gap between product and process. The journal brings together chemical and process engineering researchers, practitioners, and software developers in a new forum for the international modeling and simulation community. Editors represent top engineering institutions across the globe, such as the University of Tehran, the Ecole Polytechnique de Montreal, Rutgers, Indian Institute of Technology, the Technical University Hamburg, Jordan University of Science and Technology, Dalhouse University, University Politehnica of Bucharest, University College London, Auburn University, Universidade do Minho, National University of Singapore, University of Paderborn, University of Lapeenranta, University of Pannonia, The City College of New York, Indian Institute of Technology Roorkee, Texas A&M University at Qatar, Texas A&M University at Qatar, Politecnico of Milano, University of Wollongong, Norwegian University of Science and Technology, CANMET Energy Technology Centre, University of Saskatchewan, Universitat Politecnica de Catalunya, Ecole Nationale Supérieure en Génie des Technologies Industrielles, ENSGTI, University of Western Ontario, Aristotle University of Thessaloniki and Centre for Research and Technology, IFP Energies nouvelles, University of Calgary, Abo Akademi University, Technical University Hamburg, University of Auckland, UCLA School of Public Health and the University of Buenos Aires.

Topics
  • equation oriented and modular simulation
  • optimization technology for process and materials design, new modeling techniques
  • shortcut modeling and design approaches
  • performance of commercial and in-house simulation and optimization tools
  • challenges faced in industrial product and process simulation and optimization
  • computational fluid dynamics
  • environmental process, food and pharmaceutical modeling
  • topics drawn from the substantial areas of overlap between modeling and mathematics applied to chemical products and processes
Article formats
Editorial Notes, Research Articles, Reviews

> Information on submission process

Submit Article

Your Benefits

Your benefits:
  • the premier forum for research on product and process design modeling and simulation
  • theoretical and applied approach to the subject-matter
  • the best papers from around the world on modern modeling, design, simulation and optimization techniques
  • international editorial board

History

  • September 3, 2025
    Ganesh Botla, Praveen BVS, Mallaiah Mekala
  • September 3, 2025
    Peng Xu, Jidong Zhang
  • September 3, 2025
    Zhaiaibai Ma, Ye Wang
  • September 2, 2025
    Amal Bouribab, Ammar A. Razzak Mahmood, El Mehdi Karim, Meriem Khedraoui, Lamiae El Bouamri, Abdelkbir Errougui, Samir Chtita
  • August 29, 2025
    Nguyen Van Nguyen, Vahid Pirouzfar
  • August 25, 2025
    Majed M. A. Munasser, Sabla Y. Alnouri, Abdelbaki Benamor
  • August 21, 2025
    Kawthar A. AL-Shami, Mohsen H. Fagr
  • Requires Authentication Unlicensed
    Licensed
    A review on the synthesis, properties, and applications of Janus nanoparticles
    August 15, 2025
    Rallabandi Pattabhi Ramaraju, Vissamsetti Jairam, Mohammed Saleem Farhaan, BVS Praveen, Pachimatla Rajesh, Mechiri Sandeep Kumar
  • August 15, 2025
    Amin Khatami, Hooman Fatoorehchi, Ehsan Maani Miandoab
  • August 14, 2025
    Somayeh Mansouri, Farhad Shahraki, Jafar Sadeghi, Esmaeil Koohestanian, Mohammad Reza Sardashti Birjandi
  • August 4, 2025
    Pudi Sreenivasa Rao, Chandrakala Panguluri
  • August 1, 2025
    James C. Ehiem, Promise C. Chijoke, Nneoma E. Obasi, Ndubisi A. Aviara
  • August 1, 2025
    Chonglin Fan, Qing Hu
  • August 1, 2025
    Prashant Garg, Brijendra Mishra
  • August 1, 2025
    Babu Rao C. Gnanasekara, Thangallapalli Srinivas, Rajesh Pachimatla, A. V. Raghavendra Rao, Govindarajan Rajendran, Elangovan Ramkuppan
  • August 1, 2025
    Jayakaran Amalraj Isaac, Alexander Raymand Goudie, Jayakumar Jayaraman, Vidhuran Kumar Moorthy
  • July 31, 2025
    Suneet Dhanasekaran, Karthika Shanmugam, Saravanathamizhan Ramanujam
  • July 31, 2025
    Mallaiah Mekala, Prasad Babu Koorla, Ramesh Kola, Bhavani Pokala, Anwar Shaik, Sai Mani Yogesh Kosuru, Yashraj Delhiwala
  • July 25, 2025
    Meixiang Wang
  • July 22, 2025
    Yanfang Yu, Mengqiong Zhang, Huibo Meng, Zhiying Han, Junni Wang
  • July 22, 2025
    Xianghua Zhang, Yajuan Li, Bingjie Wang
  • July 22, 2025
    Dandan Song, Tao Yang
  • July 21, 2025
    Sravani Sameera Vanjarana, Jyothi Thadaveni, Sravya Reddy Sandugari, Balaji Rao Are, Rakesh Kethavath, Ashok Kumar Kusuma, Chitti Babu Nalluri
  • July 17, 2025
    Shanmugapriya Marayanagaraj, Sundareswaran Raman, Augustine Wisely Bezalel, Abirami Thirupathy
  • July 17, 2025
    Ramesh Martha, Venugopal Rao Bakshi, Ravi Chander Maroju, Monami Das Modak, Santhosh Kumar Adpa, Kumara Swamy Gullapelli
  • July 17, 2025
    Yogesh S. Mahajan, Harshada R. Jadhav
  • July 14, 2025
    Monami Das Modak, Pradip Paik, Mallaiah Mekala
  • July 14, 2025
    Gandhi Marikannan, Perarasu V. Thangavelu
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    Licensed
    Classification of water quality based on aesthetic and chemical parameters
    July 4, 2025
    Fengmin Cheng
  • June 19, 2025
    Manjakuppam Malika, Munnure Rakshith Reddy, Bheesetty Surya, Manne Akash Yadav, Shriram S. Sonawane
  • June 19, 2025
    Ramesh Paduthalam, Suresh Krishnan
  • June 18, 2025
    Sadiq Ibrahim Almogargesh
  • June 18, 2025
    Soundharya Balasubramanian, Shree Vidhya Ramamoorthy, Ambedkar Balraj, Srinivas Vetriselvan
  • June 2, 2025
    Licianne Pimentel Santa Rosa, Karen Valverde Pontes
  • May 30, 2025
    Leijuan Ma, Kai Yuan
  • Requires Authentication Unlicensed
    Licensed
    Collimated infrared transceiver for identifying bubble and slug regimes
    May 29, 2025
    Sowndarya Kesavan, Lisha Santhanasekar, Srinivasan Packirisami, Venkatesan Muniyandi
  • May 26, 2025
    Bashir Aderemi Hamzat, Fadina Amran, Muhammad Abbas Ahmad Zaini
  • May 6, 2025
    Bhirendra Kumar, Sewan Das Patle, Satish Kumar Dewangan
  • April 16, 2025
    Yin Xiang, Yamei Lv
  • Requires Authentication Unlicensed
    Licensed
    Intelligent analysis of laboratory equipment testing data based on BERT
    March 31, 2025
    Yanbin Zhang, Dan Liu, Yang Su, Limin Du, Xiaoyu Ge, Xinsheng Gong, Jinshun Zhou
  • March 10, 2025
    Wei Ye, Yunhai Ma
  • February 10, 2025
    Sathiya Panneerselvam, Venkatesh Pathakamuri, Thota K Radhakrishnan, Kalaichelvi Ponnusamy
  • January 21, 2025
    Xiang Yin

Chemical Product and Process Modeling publishes special and thematic issues focussed on important and emerging topics in the field of study. The journal has established a rigorous process to ensure that any special issue manuscripts follow the same high-quality standards and peer review processes as regular manuscripts. For further information on the journal’s peer review policy please see the "Instructions for Authors".
Recent Special Issues

Journal Impact Factor 1.3 2024, Journal Citation Reports (Clarivate, 2025)
5-year Journal Impact Factor 1.1 2024, Journal Citation Reports (Clarivate, 2025)
Journal Citation Indicator 0.17 2024, Journal Citation Reports (Clarivate, 2025)
CiteScore 2.2 2024, Scopus (Elsevier B.V., 2025)
SCImago Journal Rank 0.257 2024, SJR (Scimago Lab, 2025; Data Source: Scopus)
Source Normalized Impact per Paper 0.514 2024, CWTS Journal Indicators (CWTS B.V., 2025; Data Source: Scopus)

Submission
You can easily submit your manuscript online. Simply go to...
http://mc.manuscriptcentral.com/dgcppm
...and you will be guided through the whole peer-reviewing and publishing process.

Your benefits of publishing with us
  • Ahead-of-print, online publication with short turnaround times
  • High quality manuscript processing through ScholarOne Manuscripts®
  • Optional open access publication
  • Accepted papers will be published online first as DOI-citable, forward-linked articles for quickest possible visibility for the scientific community
  • Every article easily discoverable because of Search Engine Optimization (SEO) and comprehensive abstracting and indexing services
  • Secure archiving by De Gruyter and the independent archiving service Portico
  • Professional sales and marketing activities

Submission process

  • Before preparing a manuscript please have a look at our Instruction for Authors
  • Submission of your paper via our submission management tool
  • Peer review process (you will be guided through every step)
  • If accepted: you have the option to publish it open access
Please note
  • We encourage software developers and other practitioners to submit articles on specific topics to the journal
  • Articles published in CPPM must be of the highest scientific quality and originality. They are expected to be widely read and cited by all interested researchers and engineers in the field of chemical process and product simulation who, in turn, will have immediate access to high quality and relevant articles in their area
  • Manuscripts must be written in clear and concise English
  • Before submitting your article please have a look at our Ethical Guidelines and our Copyright Transfer Agreement
  • Once your article is accepted you have the option to publish it open access
  • Our Repository Policy allows you to distribute 30 PDF copies of your published article to colleagues (the PDF has to include the information that it is an author's copy). Please also feel free to distribute the link to the online abstract
  • If you have any general questions please visit our FAQ page for authors or contact us at: cppm@degruyter.com

We look forward to receiving your manuscript!

Open Access

In this journal, authors have the option to publish their article under an open access license. Open access allows you as an author to retain copyright and share your findings with colleagues and interested parties worldwide without any restraints. Each article published under an open access license is subject to an Article Processing Charge of €2300.

Editorial Board
Jamal Chaouki, Ecole Polytechnique de Montreal, Canada, jamal.chaouki@polymtl.ca
Navid Mostoufi, University of Tehran, Iran, mostoufi@ut.ac.ir
Rahmat Sotudeh-Gharebagh, University of Tehran, Iran sotudeh@ut.ac.ir, cppm@degruyter.com

Associate Editors
Thomas A. Adams II, McMaster University, Canada tadams@mcmaster.ca
Mohd Azlan Bin Hussain, University of Malaya, Malaysia mohd_azlan@um.edu.my
Diego Barletta, Università di Salerno, Italy, dbarletta@unisa.it
Miryan Cassanello, Universidad de Buenos Aires, Argentina miryan@di.fcen.uba.ar
Mario R. Eden, Auburn University, USA edenmar@auburn.edu
Eugénio C. Ferreira, Universidade do Minho, Portugal ecferreira@deb.uminho.pt
Iftikhar Karimi, National University of Singapore, Singapore cheiak@nus.edu.sg
Eugeny Kenig, Paderborn University, Germany eugeny.kenig@upb.de
Surendra Kumar, Indian Institute of Technology Roorkee, India skumar@iitr.ac.in
Roberto Lemus-Mondaca, Universidad de Chile, rlemus@uchile.cl
Patrick Linke, Texas A&M University at Qatar, Qatar patrick.linke@qatar.tamu.edu
Iqbal Mujtaba, University of Bradford, UK, I.M.Mujtaba@bradford.ac.uk
Mark Nelson, University of Wollongong, Australia mnelson@uow.edu.au
Fernando Preto, CANMET Energy Technology Centre, Canada preto@nrcan.gc.ca
Luis Puigjaner, Universitat Politecnica de Catalunya, Spain luis.puigjaner@upc.edu
Seshagiri Rao Ambati, Indian Institute of Petroleum and Energy (IIPE), India; seshagiri.che@iipe.ac.in 
Jean-Michel Reneaume, Ecole Nationale Supérieure en Génie des Technologies Industrielles, ENSGTI, France jean-michel.reneaume@univ-pau.fr
Bill Svrcek, University of Calgary, Canada svrcek@ucalgary.ca
Jan Verstraete, IFP Energies nouvelles, France jan.verstraete@ifp.fr
Brent Young, University of Auckland, New Zealand b.young@auckland.ac.nz
Reza Zarghami, University of Tehran, Iran, rzarghami@ut.ac.ir
Edwin Zondervan, University of Twente, The Netherlands, e.zondervan@utwente.nl

Chemical Product and Process Modeling is covered by the following services:

  • Baidu Scholar
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  • Summon (ProQuest)
  • TDNet
  • TEMA Technik und Management
  • Ulrich's Periodicals Directory/ulrichsweb
  • WanFang Data
  • Web of Science - Emerging Sources Citation Index
  • WorldCat (OCLC)
  • X-MOL
  • Yewno Discover

Journal information
Additional information
eISSN:
1934-2659
Language:
English
Publisher:
De Gruyter
Additional information
First published:
May 1, 2006
Publication Frequency:
6 issues per year
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