Abstract
Surfaces of layered VSe2 crystals with self-assembled networks of nanostructures formed during the early stages of Cu deposition have been investigated by high-angle annular dark-field imaging in scanning transmission electron microscopy, energy-dispersive X-ray spectroscopy, and energy-loss near-edge structure measurements in electron energy-loss spectroscopy at high spatial resolutions. The investigations confirm that the nanostructures are elevated surface folds and that the deposited copper is rather uniformly distributed across the VSe2 surface mesh regions and the nanostructure regions. The electron energy loss near-edge structure of the L2.3 ionization edges depict that the electronic properties of Cu are modified in regard to metallic Cu, and that the electronic properties of V are modified in regard to VSe2 layered crystals while the ionization edges of Se are largely unaffected. The observations are consistent with results of structure analyses and suggest that different types of Cu-rich crystalline intercalation compounds form at the surfaces upon Cu deposition.
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We thank H. Haselier and H. Schroeder (Institute for Solid State Research, Research Center Jülich, Germany) for experimental support during metal depositions and L. Kipp and M. Skibowski (University Kiel) for providing the VSe2 substrate crystals. Financial support by the German Research Foundation (DFG contract FOR 353/1-2) is gratefully acknowledged.
References
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© 2005 Carl Hanser Verlag, München
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Articles in the same Issue
- Frontmatter
- Articles Basic
- Diffusion in molybdenum disilicide
- Martensitic transformation, ductility, and shape-memory effect of polycrystalline Ni56Mn25 – xFexGa19 alloys
- Mechanical and electrical properties of Ti2SnC dispersion-strengthened copper
- Thermodynamic and phase relation study of the Ni–Ge –O system in the solid state
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- News/Aktuelles
- Conferences/Konferenzen