Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

Roberto Fallica

doi:10.1515/aot-2019-0005

Article

Beyond grayscale lithography: inherently three-dimensional patterning by Talbot effect

Roberto Fallica

Published/Copyright: May 23, 2019

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From the journal Advanced Optical Technologies Volume 8 Issue 3-4

Abstract

There are a growing number of applications where three-dimensional patterning is needed for the fabrication of micro- and nanostructures. Thus far, grayscale lithography is the main technique for obtaining a thickness gradient in a resist material that is exploited for pattern transfer by anisotropic etch. However, truly three-dimensional structures can only be produced by unconventional lithography methods such as direct laser writing, focused ion beam electrodeposition, colloidal sphere lithography, and tilted multiple-pass projection lithography, but at the cost of remarkable complexity and lengthiness. In this work, the three-dimensional shape of light, which is formed by Talbot effect diffraction, was exploited to produce inherently three-dimensional patterns in a photosensitive polymer. Using light in the soft X-ray wavelength, periodic three-dimensional structures of lateral period 600 nm were obtained. The position at which the sample has to be located to be in the Fresnel regime was simulated using an analytical implementation of the Fresnel integrals approach. Exploiting the light shape forming in diffraction effects thus enables the patterning of high-resolution three-dimensional nanostructures over a large area and with a single exposure pass – which would be otherwise impossible with conventional lithographic methods.

Keywords: 3D lithography; grayscale lithography; soft X-rays; Talbot

Acknowledgments

The contributions of Michaela Vockenhuber, Markus Kropf, and Iacopo Mochi (Paul Scherrer Institute) are kindly acknowledged. Part of this work was performed at the Swiss Light Source of the Paul Scherrer Institute.

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Received: 2019-01-10

Accepted: 2019-04-23

Published Online: 2019-05-23

Published in Print: 2019-06-26

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Articles in the same Issue

https://doi.org/10.1515/aot-2019-0005

Keywords for this article

3D lithography; grayscale lithography; soft X-rays; Talbot