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Structural properties of sputter-deposited nanocrystalline Ni thin films

  • Murat Danışman EMAIL logo
Published/Copyright: September 6, 2022
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Materials Testing
From the journal Materials Testing Volume 64 Issue 9

Abstract

For this study, Ni thin films were deposited on a glass substrate by using 200, 300, and 400 W direct-current magnetron sputtering method for observing the effect of sputtering power on the structural properties of thin films. Grain size, crystallinity, orientation, and texture of the deposited thin films were observed and evaluated by X-ray diffraction (XRD) analysis. According to XRD analysis, all thin films presented crystalline atomic structure. Furthermore, the effect of texture on the structural properties were observed using strain analysis and grain sizes that were calculated by Scherrer’s method and Williamson-Hall analysis. The analysis revealed that the grain size of sputter-deposited thin films increased linearly with respect to the increasing sputtering power. Additionally, the elastic modulus and indentation hardness of the samples were measured by nanoindentation method, and the results were evaluated in terms of grain size and texture. The highest grain size, 7.30 nm, was observed on a 400 W sputter-deposited sample, which also had the highest elastic modulus and indentation hardness values as 98 and 3.6 GPa, respectively.

Keywords: nanocrystalline thin films; nanoindentation; sputter deposition; texture coefficient; thin film Ni
Corresponding author: Murat Danışman, Metallurgical and Materials Engineering Department, İstanbul Gedik University, Istanbul, 34953, Turkey, E-mail:

Acknowledgment

The author thanks the Yildiz Technical University, Faculty of Chemistry-Metallurgy, Metallurgical and Materials Engineering Department. The author also thanks his teacher, Prof. Dr. Nurhan Cansever.

  1. Author contributions: The author has accepted responsibility for the entire content of this submitted manuscript and approved submission.

  2. Research funding: None declared.

  3. Conflict of interest statement: The author declares no conflicts of interest regarding this article.

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Published Online: 2022-09-06
Published in Print: 2022-09-27

© 2022 Walter de Gruyter GmbH, Berlin/Boston

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  3. Tension-compression asymmetry of quadruple CuCoNiBe alloys processed by high-temperature multi-pass equal channel angular pressing (ECAP)
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https://doi.org/10.1515/mt-2022-0039
Keywords for this article
nanocrystalline thin films; nanoindentation; sputter deposition; texture coefficient; thin film Ni

Articles in the same Issue

  1. Frontmatter
  2. Effect of local heat treatment on residual stresses in an in-service repair welded pipeline
  3. Tension-compression asymmetry of quadruple CuCoNiBe alloys processed by high-temperature multi-pass equal channel angular pressing (ECAP)
  4. Structural properties of sputter-deposited nanocrystalline Ni thin films
  5. Effect of the notch location on the Charpy-V toughness results for robotic flux-cored arc welded multipass joints
  6. Effect of micro and nano-sized ZrSiO4 particles on the friction and wear properties of polymer matrix composites
  7. Evaluation of the plastic deformation behavior of modified 100Cr6 steels with increased fractions of retained austenite using cyclic indentation tests
  8. Thermomechanical evaluation of a glass-epoxy composite for astronomical optical devices
  9. Artificial gorilla troops algorithm for the optimization of a fine plate heat exchanger
  10. Metallurgical properties of boride layers formed in pack boronized cementation steel
  11. Numerical study of composite plates jointed adhesively with interspaced and interspaced double-lap joint subject to tensile load
  12. Thermal analysis and performance testing of heavy load truck composite brake linings
  13. Vibration characteristics of mineral composite beams by experimental modal test method
  14. Overview of friction welding processes for different metallic materials
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