Antibacterial Activity Inhibition after the Degradation of Flumequine by UV/H2O2
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Caio Rodrigues da Silva
Abstract
Flumequine is a broad-spectrum antibacterial agent of the quinolone class widely used as veterinary drug in food-producing animals. It is considered as pseudo-persistent compound continuously introduced into the environment and its presence in the environment may contribute to the development of drug resistant bacterial strains. In this study antibacterial activity removal during flumequine degradation by UV/H2O2 was evaluated. The results showed that the advanced oxidation processes (AOPs) using UV/H2O2 was effective in removing the antibacterial activity of flumequine in aqueous solution. The dose-response dropped as the AOP removed flumequine from the solution during the treatment. After 15 minutes, the log dilution rose from -1.0 to -0.18 to achieve the antibacterial veterinary drug EC50. Moreover, after 30 minutes it was untraceable, which indicates flumequine degradation through AOP, as confirmed by quantitative HPLC analyses (degradation higher than 99%). It was also shown that the by-products formed during the oxidation did not offer stronger antibacterial activity. These results showed that AOP is technically efficient for the treatment of aqueous solutions containing flumequine.
© 2016 by Walter de Gruyter Berlin/Boston
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- Degradation of Acid Orange 7 Solution by Air-liquid Gliding Arc Discharge in Combination with TiO2 Catalyst
- Comparing the Formation of Bromate and Bromoform Due to Ozonation and UV-TiO2 Oxidation in Seawater
- Degradation of Ibuprofen Sodium Salt in a Hybrid Photolysis – Membrane Distillation System Utilizing Germicidal UVC Lamp
- Significance of TiO2 Photocatalysis for Green Chemistry
- Electrochemical Treatment of Segregated Effluents from the D-Stage in ECF Kraft Cellulose Bleaching
- A Study on the Removal of Natural Organic Matter and Disinfection Byproducts Formation Potential from Groundwater Using Fenton’s Process
- Investigation of Electric Discharge Sound in Atmospheric Pressure Plasma Using Optical Wave Microphone
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