Cross-sectional high-resolution transmission electron microscopy at Mo/Si multilayer stacks
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Thomas Höche
Abstract
Using a Mo/Si multilayer stack, capabilities and limits of high-resolution transmission electron microscopy with respect to thin film analysis are pointed out. Image processing is shown to provide non-subjective criteria for the determination of layer thicknesses. In comparison to measurements by X-ray reflectometry, an integrating method capable of determining multilayer periodicities, preparation and observation artefacts in transmission electron microscopy is discussed. Special emphasis is placed on cleavage as a powerful method for TEM sample preparation, its advantages and disadvantages.
Dedicated to Professor Dr. Knut Urban on the occasion of his 65th birthday
Funding statement: This study was initiated by A. Köhler (now with: von Ardenne Anlagentechnik GmbH). I wish to cordially thank J. W. Gerlach (IOM Leipzig) for administering reflectometry measurements, fruitful discussions, and helpful suggestions. The assistance of R. Scholz (Max Planck Institute for Microstructure Physics in Halle) in sample cleaving proved particularly valuable and is gratefully acknowledged. G. Otto (IOT GmbH), B. Ocker (Singulus Technologies AG), and M. Scherer (Leybold Optics) provided the multilayer sample and access to the high-resolution TEM facilities at the Max Planck Institute for Microstructure Physics in Halle was bestowed by U. M. Gösele
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© 2006 Carl Hanser Verlag, München
Articles in the same Issue
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Articles in the same Issue
- Frontmatter
- Editorial
- Professor Dr. Knut Urban 65 Years
- Basic
- Ordering processes and atomic defects in FeCo
- Atomic resolution electron tomography: a dream?
- Electron tomography of microelectronic device interconnects
- Aberration correction in electron microscopy
- Off-axis electron holography: Materials analysis at atomic resolution
- Determination of phases of complex scattering amplitudes and two-particle structure factors by investigating diffractograms of thin amorphous foils
- Prospects of the multislice method for CBED pattern calculation
- Electron energy-loss spectrometry for metals:some thoughts beyond microanalysis
- Quantitative assessment of nanoparticle size distributions from HRTEM images
- Quantitative microstructural and spectroscopic investigation of inversion domain boundaries in sintered zinc oxide ceramics doped with iron oxide
- Structural domains in antiferromagnetic LaFeO3 thin films
- Short-range order of liquid Ti72.3Fe27.7 investigated by a combination of neutron scattering and X-ray diffraction
- Extended interfacial structure between two asymmetrical facets of a Σ = 9 grain boundary in copper
- Dislocation imaging in fcc colloidal single crystals
- Applied
- Omega phase transformation – morphologies and mechanisms
- Mixed (Sr1 − xCax)33Bi24Al48O141 fullerenoids: the defect structure analysed by (S)TEM techniques
- Wetting of aluminium-based complex metallic alloys
- Annealing-induced phase transitions in a Zr–Ti–Nb–Cu–Ni–Al bulk metallic glass matrix composite containing quasicrystalline precipitates
- Special planar defects in the structural complex metallic alloys of Al–Pd–Mn and Al–Ni–Rh
- On the formation of Si nanowires by molecular beam epitaxy
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- An investigation of improved titanium/titanium nitride barriers for submicron aluminum-filled contacts by energy-filtered transmission electron microscopy
- Radiation damage during HRTEM studies in pure Al and Al alloys
- Cross-sectional high-resolution transmission electron microscopy at Mo/Si multilayer stacks
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- Microstructure and properties of surface-treated Timetal 834
- Notifications
- Personal
- Conferences