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ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application

  • Hao Liu , Lars Jensen EMAIL logo , Ping Ma and Detlev Ristau
Published/Copyright: March 21, 2018
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Advanced Optical Technologies
From the journal Advanced Optical Technologies Volume 7 Issue 1-2

Abstract

Atomic layer deposition (ALD) facilitates the deposition of coatings with precise thickness, high surface conformity, structural uniformity, and nodular-free structure, which are properties desired in high-power laser coatings. ALD was studied to produce uniform and stable Al2O3 and HfO2 single layers and was employed to produce anti-reflection coatings for the harmonics (1ω, 2ω, 3ω, and 4ω) of the Nd:YAG laser. In order to qualify the ALD films for high-power laser applications, the band gap energy, absorption, and element content of single layers were characterized. The damage tests of anti-reflection coatings were carried out with a laser system operated at 1ω, 2ω, 3ω, and 4ω, respectively. The damage mechanism was discussed by analyzing the damage morphology and electric field intensity difference. ALD coatings exhibit stable growth rates, low absorption, and rather high laser-induced damage threshold (LIDT). The LIDT is limited by HfO2 as the employed high-index material. These properties indicate the high versatility of ALD films for applications in high-power coatings.

Keywords: ALD Al2O3; ALD HfO2; anti-reflection coating; LIDT

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Received: 2017-12-7
Accepted: 2018-1-16
Published Online: 2018-3-21
Published in Print: 2018-4-25

©2018 THOSS Media & De Gruyter, Berlin/Boston

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  2. Editorial
  3. Reviewer recognition and editor’s note
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https://doi.org/10.1515/aot-2017-0086
Keywords for this article
ALD Al2O3; ALD HfO2; anti-reflection coating; LIDT

Articles in the same Issue

  1. Cover and Frontmatter
  2. Editorial
  3. Reviewer recognition and editor’s note
  4. Community
  5. News
  6. Topical Issue: Optical Coatings
  7. Editorial
  8. Special issue on optical coatings
  9. Review Article
  10. Simulation of the optical coating deposition
  11. Research Articles
  12. ALD anti-reflection coatings at 1ω, 2ω, 3ω, and 4ω for high-power ns-laser application
  13. Determination of refractive index and thickness of YbF3 thin films deposited at different bias voltages of APS ion source from spectrophotometric methods
  14. Effects of fixture rotation on coating uniformity for high-performance optical filter fabrication
  15. Design and manufacture of super-multilayer optical filters based on PARMS technology
  16. Tutorial
  17. Monolithic photonic integration for visible and short near-infrared wavelengths: technologies and platforms for bio and life science applications
  18. Review Articles
  19. Optimization of freeform surfaces using intelligent deformation techniques for LED applications
  20. On-chip photonic microsystem for optical signal processing based on silicon and silicon nitride platforms
  21. Letter
  22. On-chip Mach-Zehnder interferometer for OCT systems
  23. Research Article
  24. Broadband and scalable optical coupling for silicon photonics using polymer waveguides
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