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Schottky barrier formation in liquid-phase-sintered silicon carbide

  • Hans-Joachim Kleebe EMAIL logo and Frank Siegelin
Published/Copyright: January 11, 2022
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Abstract

Liquid-phase-sintered SiC materials, all doped with 3 vol.% YAG (Y3Al5O12) and sintered under identical conditions but processed in different furnaces (laboratory vs. industrial furnaces), revealed a variation in electrical resistivity of five orders of magnitude (102 vs.107 Ωcm). It was expected that, due to different cooling rates, different interface structures had evolved that strongly affected electrical resistivity, i. e., changes in intergranular film chemistry and corresponding thickness. In order to verify this hypothesis, the materials were characterized employing various techniques. High-resolution transmission electron microscopy of SiC interfaces revealed an unexpected result: clean interfaces for all samples. Elemental analysis confirmed yttrium and aluminum segregation at grain boundaries. Electron holography and Fresnel-fringe imaging revealed a change in mean inner potential across SiC interfaces. It is concluded that the segregation of acceptor ions at interfaces lowers the grain-boundary Fermi energy, resulting in the formation of potential barriers (Schottky barriers) along SiC interfaces, which in turn strongly affect electrical resistivity of SiC polycrystals.


Dr. H.-J. Kleebe Colorado School of Mines, Metall. & Mater. Eng. Dept. Golden, CO 80401, USA Tel.: +1 303 273 3952 Fax: +1 303 273 3057
Dedicated to Prof. Dr. Dr. h. c. Manfred Rühle on the occasion of his 65th birthday

Funding statement: We are greatly indebted to Prof. G. Ziegler, University of Bayreuth for his continuous support throughout this work. Moreover, we would like to express our sincere thanks to Drs. S. L. Sigl and K. A. Schwetz, Wacker Ceramics, Kempten, Germany, for providing these interesting materials and for their financial support for F. S. Dr. M. Lehmann and Prof. H. Lichte, Technical University Dresden, Germany, are gratefully acknowledged for their strong support during the electron holography experiments.

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Received: 2002-09-09
Published Online: 2022-01-11

© 2003 Carl Hanser Verlag, München

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