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Nanomechanical studies of ultrathin polymeric resist films

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Published/Copyright: May 23, 2013

Abstract

An atomic force microscope with a specially constructed stiff cantilever was used to study the mechanical properties of ultrathin polymeric resist films devoted to use in nanoimprint lithography. The methodology, the equipment used in these studies and the results of the estimation of the Young's modulus versus temperature are presented and discussed.


* Correspondence address, Prof. Zygmunt Rymuza, sw. A. Boboli 8 Street, 02-525 Warsaw, Poland, Tel.: +48 22 660 8540, Fax: +48 22 660 8601, E-mail:

References

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Received: 2006-10-11
Accepted: 2007-1-14
Published Online: 2013-05-23
Published in Print: 2007-05-01

© 2007, Carl Hanser Verlag, München

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