Artikel
Open Access
Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation
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V.B. Voitovich,
Veröffentlicht/Copyright:
6. Mai 2011
Published Online: 2011-05-06
Published in Print: 1996-09
©2011 by Walter de Gruyter GmbH & Co.
Artikel in diesem Heft
- CONTENTS
- A Thermodynamic Criterion for Selection of Gas Compositions for Diamond Deposition
- On the Local Structure of Liquid Gallium from EXAFS Studies
- Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition
- Sulphide Capacities of CaO-Al2O3 Slags in the Temperature Range 1773-1848 K.
- Nitridation in the Processing and Preparation of Metals and Ceramics
- Microstructural Refinement of Cast Ti48Al2W0.5Si Alloy by Static Heat Treatment
- Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation
Creative Commons
BY-NC-ND 3.0
Artikel in diesem Heft
- CONTENTS
- A Thermodynamic Criterion for Selection of Gas Compositions for Diamond Deposition
- On the Local Structure of Liquid Gallium from EXAFS Studies
- Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition
- Sulphide Capacities of CaO-Al2O3 Slags in the Temperature Range 1773-1848 K.
- Nitridation in the Processing and Preparation of Metals and Ceramics
- Microstructural Refinement of Cast Ti48Al2W0.5Si Alloy by Static Heat Treatment
- Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation
