Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

V.A.C. Haanappel,; H.D. van Corbach,; R. Hofman,; R.W.J. Morssinkhof,; T. Fransen,; P.J. Gellings,

doi:10.1515/HTMP.1996.15.4.245

Home Physical Sciences Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

Article Open Access

Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

V.A.C. Haanappel, , H.D. van Corbach, , R. Hofman, , R.W.J. Morssinkhof, , T. Fransen, and P.J. Gellings,

Published/Copyright: May 6, 2011

Download Article (PDF)

Published by

Become an author with De Gruyter Brill

Submit Manuscript Author Information Explore this Subject

From the journal High Temperature Materials and Processes Volume 15 Issue 4

MLA
APA
Harvard
Chicago
Vancouver

MLA
APA
Harvard
Chicago
Vancouver

Haanappel,, V.A.C., van Corbach,, H.D., Hofman,, R., Morssinkhof,, R.W.J., Fransen,, T. and Gellings,, P.J.. "Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition" High Temperature Materials and Processes, vol. 15, no. 4, 1996, pp. 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel,, V., van Corbach,, H., Hofman,, R., Morssinkhof,, R., Fransen,, T. & Gellings,, P. (1996). Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition. High Temperature Materials and Processes, 15(4), 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel,, V., van Corbach,, H., Hofman,, R., Morssinkhof,, R., Fransen,, T. and Gellings,, P. (1996) Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition. High Temperature Materials and Processes, Vol. 15 (Issue 4), pp. 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel,, V.A.C., van Corbach,, H.D., Hofman,, R., Morssinkhof,, R.W.J., Fransen,, T. and Gellings,, P.J.. "Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition" High Temperature Materials and Processes 15, no. 4 (1996): 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel, V, van Corbach, H, Hofman, R, Morssinkhof, R, Fransen, T, Gellings, P. Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition. High Temperature Materials and Processes. 1996;15(4): 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Copy

Copied to clipboard

BibTeX EndNote RIS

Published Online: 2011-05-06

Published in Print: 1996-09

Articles in the same Issue

CONTENTS
A Thermodynamic Criterion for Selection of Gas Compositions for Diamond Deposition
On the Local Structure of Liquid Gallium from EXAFS Studies
Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition
Sulphide Capacities of CaO-Al2O3 Slags in the Temperature Range 1773-1848 K.
Nitridation in the Processing and Preparation of Metals and Ceramics
Microstructural Refinement of Cast Ti48Al2W0.5Si Alloy by Static Heat Treatment
Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation

Search journal Search the content of this journal

https://doi.org/10.1515/HTMP.1996.15.4.245

Creative Commons

BY-NC-ND 3.0

Articles in the same Issue

CONTENTS
A Thermodynamic Criterion for Selection of Gas Compositions for Diamond Deposition
On the Local Structure of Liquid Gallium from EXAFS Studies
Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition
Sulphide Capacities of CaO-Al2O3 Slags in the Temperature Range 1773-1848 K.
Nitridation in the Processing and Preparation of Metals and Ceramics
Microstructural Refinement of Cast Ti48Al2W0.5Si Alloy by Static Heat Treatment
Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation