Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects

H.J. Mathieu,; D. Leonard,

doi:10.1515/HTMP.1998.17.1-2.29

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Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects

H.J. Mathieu, and D. Leonard,

Published/Copyright: May 6, 2011

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From the journal High Temperature Materials and Processes Volume 17 Issue 1-2

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Mathieu,, H.J. and Leonard,, D.. "Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects" High Temperature Materials and Processes, vol. 17, no. 1-2, 1998, pp. 29-44. https://doi.org/10.1515/HTMP.1998.17.1-2.29

Mathieu,, H. & Leonard,, D. (1998). Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects. High Temperature Materials and Processes, 17(1-2), 29-44. https://doi.org/10.1515/HTMP.1998.17.1-2.29

Mathieu,, H. and Leonard,, D. (1998) Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects. High Temperature Materials and Processes, Vol. 17 (Issue 1-2), pp. 29-44. https://doi.org/10.1515/HTMP.1998.17.1-2.29

Mathieu,, H.J. and Leonard,, D.. "Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects" High Temperature Materials and Processes 17, no. 1-2 (1998): 29-44. https://doi.org/10.1515/HTMP.1998.17.1-2.29

Mathieu, H, Leonard, D. Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects. High Temperature Materials and Processes. 1998;17(1-2): 29-44. https://doi.org/10.1515/HTMP.1998.17.1-2.29

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Published Online: 2011-05-06

Published in Print: 1998-01

Articles in the same Issue

TABLE OF CONTENTS
Preface
Surface Segregated Layer and Native Oxide Layer Formed on High-Purity Iron Base Alloys by Angle-Resolved XPS
Sputter Depth Profiling of Thin Films
Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects
Mossbauer Spectroscopy and its Application to Materials Research
Positron Annihilation Method: Thermal and Non-Thermal Defects in Refractory Intermetallics
Nanoscale Microstructural Analyses by Atom Probe Field Ion Microscopy
REVIEW: Quantitative Transmission Electron Microscopy with Imaging Plates
Glow Discharge Optical Emission Spectroscopy- The Fundamental Principles
Structural Characterization of Surfaces and Interfaces of Materials by Applying X-ray Total External Reflection Phenomena
Structural Studies of Aqueous Solutions by the Anomalous X-ray Scattering Method

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Articles in the same Issue

TABLE OF CONTENTS
Preface
Surface Segregated Layer and Native Oxide Layer Formed on High-Purity Iron Base Alloys by Angle-Resolved XPS
Sputter Depth Profiling of Thin Films
Use of Post-Ionisation Techniques to Complement SIMS Analysis. A Review With Practical Aspects
Mossbauer Spectroscopy and its Application to Materials Research
Positron Annihilation Method: Thermal and Non-Thermal Defects in Refractory Intermetallics
Nanoscale Microstructural Analyses by Atom Probe Field Ion Microscopy
REVIEW: Quantitative Transmission Electron Microscopy with Imaging Plates
Glow Discharge Optical Emission Spectroscopy- The Fundamental Principles
Structural Characterization of Surfaces and Interfaces of Materials by Applying X-ray Total External Reflection Phenomena
Structural Studies of Aqueous Solutions by the Anomalous X-ray Scattering Method