Large area nanoimprint by substrate conformal imprint lithography (SCIL)
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Marc A. Verschuuren
Marc A. Verschuuren received a bachelor degree in Chemical Engineering from the Fontys University, Eindhoven, The Netherlands in 2002. In 2010 he obtained his PhD on Substrate Conformal Imprint Lithography for nanophotonics from the Utrecht University, The Netherlands, supervised by Prof. Albert Polman from the AMOLF institute. Marc worked at Philips research Eindhoven, The Netherlands as senior scientist and project leader from 2001–2015 on various projects such as printable LCD backplanes, micro-patterning for garment care, micro-structured transparent ceramics, 3D photonic crystals, 2D photonic crystals for LEDs, VCSEL lasers, nano-LEDs and plasmonics for: photovoltaics and general LED illumination. All the applications required large area nano- and micro-patterning and during this time he developed the nanoimprint method Substrate Conformal Imprint Lithography. Since 2015 he started the Philips venture SCIL Nanoimprint solutions, developing SCIL based volume production solutions.
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Mischa Megens
Yongfeng Ni received the B.Eng. degree in Optical Engineering from Zhejiang University, Hangzhou, China, in 1997. He was research assistant at Zhejiang University from 1997 to 2001 and was research assistant at Central Research Laboratory of Hamamatsu Photonics, Japan from 1998 to 1999. He carried out his doctoral research at FOM institute AMOLF, Amsterdam from 2001 to 2005 and received the PhD degree in laser physics from Radboud University Nijmegen, the Netherlands in 2006. He was with Philips Research Laboratory, Eindhoven, the Netherlands from 2006 to 2010. Since 2011, he has been with ASML, Veldhoven, the Netherlands, currently working on EUV illumination, imaging simulation and wafer alignment.
Hans van Sprang has studied Chemistry and Physics at Leyden university and started to work at Philips Research in 1980. He worked on various topics like Liquid Crystal Display physics, analytical X-ray instrumentation and analysis and optical materials for Lighting applications. In this context he was first project leader of the work on SCIL and later on hosted the project in the Photonic Materials and Devices Department which he headed from 2008 till 2015.
Albert Polman is scientific group leader and program leader at the AMOLF Institute in Amsterdam, the Netherlands. He is associated with the University of Amsterdam as a professor of Photonic materials for photovoltaics. Polman’s research focuses on nanophotonics: the control, understanding and application of light at the nanoscale, with special emphasis on light management in solar cells and optical metamaterials. In parallel, his group has developed angle-resolved cathodoluminescence spectroscopy as a new tool for super-resolution imaging. Polman obtained his PhD from the University of Utrecht, was post-doctoral researcher at AT&T Bell Laboratories and then became group leader at AMOLF, where he also served as director from 2006–2013. He has published over 300 papers in photonics and photovoltaics.
Abstract
Releasing the potential of advanced material properties by controlled structuring materials on sub-100-nm length scales for applications such as integrated circuits, nano-photonics, (bio-)sensors, lasers, optical security, etc. requires new technology to fabricate nano-patterns on large areas (from cm2 to 200 mm up to display sizes) in a cost-effective manner. Conventional high-end optical lithography such as stepper/scanners is highly capital intensive and not flexible towards substrate types. Nanoimprint has had the potential for over 20 years to bring a cost-effective, flexible method for large area nano-patterning. Over the last 3–4 years, nanoimprint has made great progress towards volume production. The main accelerator has been the switch from rigid- to wafer-scale soft stamps and tool improvements for step and repeat patterning. In this paper, we discuss substrate conformal imprint lithography (SCIL), which combines nanometer resolution, low patterns distortion, and overlay alignment, traditionally reserved for rigid stamps, with the flexibility and robustness of soft stamps. This was made possible by a combination of a new soft stamp material, an inorganic resist, combined with an innovative imprint method. Finally, a volume production solution will be presented, which can pattern up to 60 wafers per hour.
About the authors
Marc A. Verschuuren received a bachelor degree in Chemical Engineering from the Fontys University, Eindhoven, The Netherlands in 2002. In 2010 he obtained his PhD on Substrate Conformal Imprint Lithography for nanophotonics from the Utrecht University, The Netherlands, supervised by Prof. Albert Polman from the AMOLF institute. Marc worked at Philips research Eindhoven, The Netherlands as senior scientist and project leader from 2001–2015 on various projects such as printable LCD backplanes, micro-patterning for garment care, micro-structured transparent ceramics, 3D photonic crystals, 2D photonic crystals for LEDs, VCSEL lasers, nano-LEDs and plasmonics for: photovoltaics and general LED illumination. All the applications required large area nano- and micro-patterning and during this time he developed the nanoimprint method Substrate Conformal Imprint Lithography. Since 2015 he started the Philips venture SCIL Nanoimprint solutions, developing SCIL based volume production solutions.
Yongfeng Ni received the B.Eng. degree in Optical Engineering from Zhejiang University, Hangzhou, China, in 1997. He was research assistant at Zhejiang University from 1997 to 2001 and was research assistant at Central Research Laboratory of Hamamatsu Photonics, Japan from 1998 to 1999. He carried out his doctoral research at FOM institute AMOLF, Amsterdam from 2001 to 2005 and received the PhD degree in laser physics from Radboud University Nijmegen, the Netherlands in 2006. He was with Philips Research Laboratory, Eindhoven, the Netherlands from 2006 to 2010. Since 2011, he has been with ASML, Veldhoven, the Netherlands, currently working on EUV illumination, imaging simulation and wafer alignment.
Hans van Sprang has studied Chemistry and Physics at Leyden university and started to work at Philips Research in 1980. He worked on various topics like Liquid Crystal Display physics, analytical X-ray instrumentation and analysis and optical materials for Lighting applications. In this context he was first project leader of the work on SCIL and later on hosted the project in the Photonic Materials and Devices Department which he headed from 2008 till 2015.
Albert Polman is scientific group leader and program leader at the AMOLF Institute in Amsterdam, the Netherlands. He is associated with the University of Amsterdam as a professor of Photonic materials for photovoltaics. Polman’s research focuses on nanophotonics: the control, understanding and application of light at the nanoscale, with special emphasis on light management in solar cells and optical metamaterials. In parallel, his group has developed angle-resolved cathodoluminescence spectroscopy as a new tool for super-resolution imaging. Polman obtained his PhD from the University of Utrecht, was post-doctoral researcher at AT&T Bell Laboratories and then became group leader at AMOLF, where he also served as director from 2006–2013. He has published over 300 papers in photonics and photovoltaics.
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©2017 THOSS Media & De Gruyter, Berlin/Boston
Artikel in diesem Heft
- Cover and Frontmatter
- Views
- Patterning roadmap: 2017 prospects
- Community
- Conference Notes
- News from the European Optical Society (EOS)
- Topical issue: Optical Nanostructuring
- Editorial
- Next-generation lithography – an outlook on EUV projection and nanoimprint
- Tutorial
- Photoresists in extreme ultraviolet lithography (EUVL)
- Review Articles
- Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
- Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
- EUV mask defectivity – a process of increasing control toward HVM
- Development and performance of EUV pellicles
- A review of nanoimprint lithography for high-volume semiconductor device manufacturing
- Large area nanoimprint by substrate conformal imprint lithography (SCIL)
- Laser interference patterning methods: Possibilities for high-throughput fabrication of periodic surface patterns
- Research Articles
- A full-process chain assessment for nanoimprint technology on 200-mm industrial platform
- Challenges of anamorphic high-NA lithography and mask making
- Research Article
- Chip bonding of low-melting eutectic alloys by transmitted laser radiation
Artikel in diesem Heft
- Cover and Frontmatter
- Views
- Patterning roadmap: 2017 prospects
- Community
- Conference Notes
- News from the European Optical Society (EOS)
- Topical issue: Optical Nanostructuring
- Editorial
- Next-generation lithography – an outlook on EUV projection and nanoimprint
- Tutorial
- Photoresists in extreme ultraviolet lithography (EUVL)
- Review Articles
- Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
- Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography
- EUV mask defectivity – a process of increasing control toward HVM
- Development and performance of EUV pellicles
- A review of nanoimprint lithography for high-volume semiconductor device manufacturing
- Large area nanoimprint by substrate conformal imprint lithography (SCIL)
- Laser interference patterning methods: Possibilities for high-throughput fabrication of periodic surface patterns
- Research Articles
- A full-process chain assessment for nanoimprint technology on 200-mm industrial platform
- Challenges of anamorphic high-NA lithography and mask making
- Research Article
- Chip bonding of low-melting eutectic alloys by transmitted laser radiation
