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Volume 66, Issue 6
Contents
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Publicly AvailableThe chemistry of etching and deposition processesJanuary 1, 2009
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Publicly AvailableMass and optical emission spectroscopy of plasmas for diamond synthesisJanuary 1, 2009
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January 1, 2009
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Publicly AvailableReview of plasma development in the former Soviet UnionJanuary 1, 2009
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Publicly AvailableThe future of thermal plasma processing for coatingJanuary 1, 2009
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Publicly AvailablePlasma fluidized and spouted bed reactors: An overviewJanuary 1, 2009
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January 1, 2009
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Publicly AvailablePlasma spraying: Present and futureJanuary 1, 2009
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Publicly AvailableDiagnostic techniques for plasma reactor temperature and species determination in advanced materials processingJanuary 1, 2009
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January 1, 2009
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Publicly AvailableModelling of dielectric barrier discharge chemistryJanuary 1, 2009
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Publicly AvailableTheory of electric corona including the role of plasma chemistryJanuary 1, 2009
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Publicly AvailableHigh power plasma arc melting process for incinerated ash contractionJanuary 1, 2009
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Publicly AvailableGliding arc: Applications to engineering and environment controlJanuary 1, 2009
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Publicly AvailableThe reactive sputtering of oxides and nitridesJanuary 1, 2009
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Publicly AvailableNucleation, growth, and morphology of dust in plasmasJanuary 1, 2009
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Publicly AvailableElectron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanismsJanuary 1, 2009
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Publicly AvailablePlasma processing techniques used at CaswellJanuary 1, 2009
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Publicly AvailableProcessing of electronic materials by microwave plasmaJanuary 1, 2009
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Publicly AvailableSelf consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmasJanuary 1, 2009
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Publicly AvailablePlasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomersJanuary 1, 2009
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Publicly AvailableReal-time monitoring of surface chemistry during plasma processingJanuary 1, 2009
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Publicly AvailableThe fullerenes: Precursors for 21st century materialsJanuary 1, 2009
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Publicly AvailablePlasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmasJanuary 1, 2009
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Publicly AvailableProperties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)January 1, 2009
