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Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
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S. C. Kim
Veröffentlicht/Copyright:
1. Januar 2009
Published Online: 2009-01-01
Published in Print: 1994-01-01
© 2013 Walter de Gruyter GmbH, Berlin/Boston
Artikel in diesem Heft
- The chemistry of etching and deposition processes
- Mass and optical emission spectroscopy of plasmas for diamond synthesis
- Atoms, radicals and ions observed in plasmas - Their gas and surface chemistry
- Review of plasma development in the former Soviet Union
- The future of thermal plasma processing for coating
- Plasma fluidized and spouted bed reactors: An overview
- High temperature processing and numerical modelling of thermal plasmas in Norway
- Plasma spraying: Present and future
- Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
- Theoretical basis of non-equilibrium near atmospheric pressure plasma chemistry
- Modelling of dielectric barrier discharge chemistry
- Theory of electric corona including the role of plasma chemistry
- High power plasma arc melting process for incinerated ash contraction
- Gliding arc: Applications to engineering and environment control
- The reactive sputtering of oxides and nitrides
- Nucleation, growth, and morphology of dust in plasmas
- Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
- Plasma processing techniques used at Caswell
- Processing of electronic materials by microwave plasma
- Decomposition of gaseous dielectrics (CF4,SF6) by a non-equilibrium plasma. Mechanisms, kinetics, mass spectrometric studies and interactions with polymeric targets
- Self consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmas
- Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
- Real-time monitoring of surface chemistry during plasma processing
- The fullerenes: Precursors for 21st century materials
- Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
- Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
Artikel in diesem Heft
- The chemistry of etching and deposition processes
- Mass and optical emission spectroscopy of plasmas for diamond synthesis
- Atoms, radicals and ions observed in plasmas - Their gas and surface chemistry
- Review of plasma development in the former Soviet Union
- The future of thermal plasma processing for coating
- Plasma fluidized and spouted bed reactors: An overview
- High temperature processing and numerical modelling of thermal plasmas in Norway
- Plasma spraying: Present and future
- Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
- Theoretical basis of non-equilibrium near atmospheric pressure plasma chemistry
- Modelling of dielectric barrier discharge chemistry
- Theory of electric corona including the role of plasma chemistry
- High power plasma arc melting process for incinerated ash contraction
- Gliding arc: Applications to engineering and environment control
- The reactive sputtering of oxides and nitrides
- Nucleation, growth, and morphology of dust in plasmas
- Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
- Plasma processing techniques used at Caswell
- Processing of electronic materials by microwave plasma
- Decomposition of gaseous dielectrics (CF4,SF6) by a non-equilibrium plasma. Mechanisms, kinetics, mass spectrometric studies and interactions with polymeric targets
- Self consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmas
- Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
- Real-time monitoring of surface chemistry during plasma processing
- The fullerenes: Precursors for 21st century materials
- Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
- Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)