Startseite Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
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Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)

  • S. C. Kim , B. S. Jin , T. Ohmae , T. Masuda und A. Nakajima
Veröffentlicht/Copyright: 1. Januar 2009

Published Online: 2009-01-01
Published in Print: 1994-01-01

© 2013 Walter de Gruyter GmbH, Berlin/Boston

Artikel in diesem Heft

  1. The chemistry of etching and deposition processes
  2. Mass and optical emission spectroscopy of plasmas for diamond synthesis
  3. Atoms, radicals and ions observed in plasmas - Their gas and surface chemistry
  4. Review of plasma development in the former Soviet Union
  5. The future of thermal plasma processing for coating
  6. Plasma fluidized and spouted bed reactors: An overview
  7. High temperature processing and numerical modelling of thermal plasmas in Norway
  8. Plasma spraying: Present and future
  9. Diagnostic techniques for plasma reactor temperature and species determination in advanced materials processing
  10. Theoretical basis of non-equilibrium near atmospheric pressure plasma chemistry
  11. Modelling of dielectric barrier discharge chemistry
  12. Theory of electric corona including the role of plasma chemistry
  13. High power plasma arc melting process for incinerated ash contraction
  14. Gliding arc: Applications to engineering and environment control
  15. The reactive sputtering of oxides and nitrides
  16. Nucleation, growth, and morphology of dust in plasmas
  17. Electron cyclotron resonance plasma etching of Si with Cl2: Plasma chemistry and mechanisms
  18. Plasma processing techniques used at Caswell
  19. Processing of electronic materials by microwave plasma
  20. Decomposition of gaseous dielectrics (CF4,SF6) by a non-equilibrium plasma. Mechanisms, kinetics, mass spectrometric studies and interactions with polymeric targets
  21. Self consistent low pressure RF (radiant flux) discharge modelling: Comparisons with experiments in clean and dusty plasmas
  22. Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
  23. Real-time monitoring of surface chemistry during plasma processing
  24. The fullerenes: Precursors for 21st century materials
  25. Plasmaphysical and plasmachemical aspects of diamond deposition in low pressure plasmas
  26. Properties of ethylene-dimethylaminoethylmethacrylate copolymers as poly(vinyl chloride) resin modifier (Technical Report)
Heruntergeladen am 9.9.2025 von https://www.degruyterbrill.com/document/doi/10.1351/pac199466061405/html
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