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Volume 62, Issue 9
Contents
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Publicly AvailableElementary processes in chemical dynamicsJanuary 1, 2009
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Publicly AvailableChemical properties of small silicon clustersJanuary 1, 2009
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Publicly AvailablePlasma deposition of semiconductor multilayer structuresJanuary 1, 2009
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Publicly AvailableSilent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiationJanuary 1, 2009
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Publicly AvailableEffects of chemical reactions in arcsJanuary 1, 2009
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Publicly AvailableDeposition of amorphous silicon alloysJanuary 1, 2009
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Publicly AvailableA growth mechanism for the vacuum deposition of polymeric materialsJanuary 1, 2009
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Publicly AvailablePlasma etching and modification of organic polymersJanuary 1, 2009
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Publicly AvailableMechanisms of silicon etching in fluorine- and chlorine-containing plasmasJanuary 1, 2009
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Publicly AvailableElectron energy distribution functions in processing plasmasJanuary 1, 2009
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Publicly AvailableModelling of chemical reactions under nonequilibrium halogenated electrical discharge conditionsJanuary 1, 2009
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Publicly AvailablePlasma and nitrides: application to the nitriding of titaniumJanuary 1, 2009
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Publicly AvailableECR (electron cyclotron resonance) plasma for thin film technologyJanuary 1, 2009
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Publicly AvailableMetallurgy of open-bath plasma processesJanuary 1, 2009
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Publicly AvailableProperties of coatings and applications of low pressure plasma sprayJanuary 1, 2009
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Publicly AvailableComplex investigation of thermophysical processes in plasma-jet sprayingJanuary 1, 2009
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Publicly AvailablePlasma spraying as an advanced tool in surface engineeringJanuary 1, 2009
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Publicly AvailablePlasma synthesis of ceramic powdersJanuary 1, 2009
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Publicly AvailableSome aspects of the generalization of electric arc characteristicsJanuary 1, 2009
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Publicly AvailablePlasma spray consolidation of materialsJanuary 1, 2009
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Publicly AvailableMeasurements of nonequilibrium effects in thermal plasmasJanuary 1, 2009
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Publicly AvailablePolarographic half-wave potentials of cations in nonaqueous solventsJanuary 1, 2009
