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Characterization of the Radical Oxidative Level in the Degradation of Phenolic Compounds with H2O2/UV

  • A. de Luis , J. I. Lombraña EMAIL logo and A. Menéndez
Published/Copyright: December 8, 2016
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Abstract

The characterization of radical oxidation was studied in phenolic compounds degradation by a H2O2/ UV advanced oxidation process (AOP). The UV irradiation source was a low-pressure mercury vapour lamp that was axially centred in a tubular reaction system. The effects of hydrogen peroxide, phenol molar ratio and pH have been investigated. From bibliography regarding the generation of radicals in the H2O2/UV system, a kinetic model has been developed, making it possible to estimate the concentration of different radical species. These concentrations mark a determined oxidative level, the evolution of which will be analyzed under a series of initial conditions involving pH and the molar ratio of phenol to hydrogen peroxide.

Received: 2007-9-12
Revised: 2007-11-29
Accepted: 2007-11-30
Published Online: 2016-12-8
Published in Print: 2008-1-1

© 2016 by Walter de Gruyter Berlin/Boston

Articles in the same Issue

  1. Preface
  2. An Integral Degradation Model to Describe H2O2-Photooxidation of Linear Alkylbenzenesulfonate (LAS) Surfactants
  3. Characterization of the Radical Oxidative Level in the Degradation of Phenolic Compounds with H2O2/UV
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