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Application of Advanced Oxidation Process Technologies to Extremely High TOC Containing Aqueous Solutions

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Veröffentlicht/Copyright: 26. Januar 2017
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Abstract

Advanced oxidation processes (UWH2O2, UVZH2O2ZO3, and photo-Fenton) have been use to remove the organic carbon from aqueous-based fluids containing initial total organic carbon (TOC0) levels up to 15000 ppm. Fluids containing ethylene glycol, polyethylene glycol (PEG200,average molecular weight 200 g mol-1) and sodium dodecylsulfate (SDS) were examined. All advanced oxidation processes investigated utilized initial H2O2 levels of up to 9 %. Reactions were carried out in a stirred batch photoreactor and mass transfer through the photolytic zone was shown not to limit the efficiency of the photooxidation process. Carbon loss from the fluids was deter­mined to be a zero-order kinetic process and the rates of carbon loss were used to calculate the energy' equivalents per unit mass (EEZM) figure-of-merit for the process. The EEZM values w'ere determined to be a function of substrate structure with EG and PEG200 being removed from solution with approximately the same efficiency, while SDS was the most difficult substrate to oxidize. The energy costs for fluid treatment by each of the three AOP methodologies investigated were determined and the factors affecting fluid treatment are discussed.

Received: 1997-4-17
Accepted: 1997-7-7
Published Online: 2017-1-26
Published in Print: 1997-7-1

© 2017 by Walter de Gruyter Berlin/Boston

Heruntergeladen am 21.4.2026 von https://www.degruyterbrill.com/document/doi/10.1515/jaots-1997-0309/html
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