Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

V.A.C. Haanappel,; H.D. van Corbach,; R. Hofman,; R.W.J. Morssinkhof,; T. Fransen,; P.J. Gellings,

doi:10.1515/HTMP.1996.15.4.245

Startseite Naturwissenschaften Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

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Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition

V.A.C. Haanappel, , H.D. van Corbach, , R. Hofman, , R.W.J. Morssinkhof, , T. Fransen, und P.J. Gellings,

Veröffentlicht/Copyright: 6. Mai 2011

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Aus der Zeitschrift High Temperature Materials and Processes Band 15 Heft 4

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Haanappel,, V.A.C., van Corbach,, H.D., Hofman,, R., Morssinkhof,, R.W.J., Fransen,, T. and Gellings,, P.J.. "Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition" High Temperature Materials and Processes, vol. 15, no. 4, 1996, pp. 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel,, V., van Corbach,, H., Hofman,, R., Morssinkhof,, R., Fransen,, T. & Gellings,, P. (1996). Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition. High Temperature Materials and Processes, 15(4), 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel,, V., van Corbach,, H., Hofman,, R., Morssinkhof,, R., Fransen,, T. and Gellings,, P. (1996) Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition. High Temperature Materials and Processes, Vol. 15 (Issue 4), pp. 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel,, V.A.C., van Corbach,, H.D., Hofman,, R., Morssinkhof,, R.W.J., Fransen,, T. and Gellings,, P.J.. "Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition" High Temperature Materials and Processes 15, no. 4 (1996): 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

Haanappel, V, van Corbach, H, Hofman, R, Morssinkhof, R, Fransen, T, Gellings, P. Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition. High Temperature Materials and Processes. 1996;15(4): 245-262. https://doi.org/10.1515/HTMP.1996.15.4.245

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Published Online: 2011-05-06

Published in Print: 1996-09

Artikel in diesem Heft

CONTENTS
A Thermodynamic Criterion for Selection of Gas Compositions for Diamond Deposition
On the Local Structure of Liquid Gallium from EXAFS Studies
Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition
Sulphide Capacities of CaO-Al2O3 Slags in the Temperature Range 1773-1848 K.
Nitridation in the Processing and Preparation of Metals and Ceramics
Microstructural Refinement of Cast Ti48Al2W0.5Si Alloy by Static Heat Treatment
Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation

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Artikel in diesem Heft

CONTENTS
A Thermodynamic Criterion for Selection of Gas Compositions for Diamond Deposition
On the Local Structure of Liquid Gallium from EXAFS Studies
Formation of Thin Oxide Films by Metal-Organic Chemical Vapour Deposition
Sulphide Capacities of CaO-Al2O3 Slags in the Temperature Range 1773-1848 K.
Nitridation in the Processing and Preparation of Metals and Ceramics
Microstructural Refinement of Cast Ti48Al2W0.5Si Alloy by Static Heat Treatment
Distribution of Impurities, Alloying and Binder Elements in Rutile (TiO2-x) Scales at High-Temperature Oxidation