Startseite Correlation between magnetic properties of CoFe single and CoFe/SiO2 multi-layer thin films and their microstructure, texture and internal stress state
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Correlation between magnetic properties of CoFe single and CoFe/SiO2 multi-layer thin films and their microstructure, texture and internal stress state

  • S. Dieter EMAIL logo , A. Pyzalla , A. Bauer , N. Schell , J. McCord , K. Seemann , N. Wanderka und W. Reimers
Veröffentlicht/Copyright: 28. Dezember 2021
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Abstract

CoFe single and multi-layer systems are deposited by a radio-frequency sputter process. Thickness, roughness, morphology, texture and internal stress state of the layers are determined by X-ray reflectometry, transmission electron microscopy, and diffraction methods. The texture and the internal stress of the layers depend strongly on the parameters of the sputter process. The magnetic properties of the layers are determined from hysteresis curve measurements and magneto-optical Kerr microscopy. A strong correlation between the texture, the internal stress, and the magnetic properties of the CoFe layers is observed.


Dr. rer. nat. Sascha Dieter, Institut für Werkstoffwissenschaften und -technologien, Technische Universität Berlin, Sekretariat BH 18, D-10587 Berlin, Germany, Tel.: +49 30 314 22174, Fax: +49 030 314 22996

Funding statement: The authors acknowledge the beamtime and technical support at the beamline BM 20 “ROBL” at ESRF operated by the Forschungszentrum Rossendorf, Germany. They further would like to thank HASYLAB at DESY, Hamburg, Germany, for beamtime at the diffractometer G3, and Dr. B. Hasse as well as Dr. Thomas Wroblewski, DESY, Germany, for their support while performing the experiments at G3. Sincere thanks are to PD Dr. Ch. Genzel, Hahn-Meitner-Institut Berlin, Germany for his support during measurements performed by the scattering-vector method and their evaluation

Funding statement: S. D., N. W., A. P., K. S. and W. R. acknowledge financial support of this work by the Helmholtz Society. The investigations were part ofthe “Strategiefondprojekt Mikrosystemtechnik”

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Received: 2003-05-26
Accepted: 2003-11-27
Published Online: 2021-12-28

© 2004 Carl Hanser Verlag, München

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