High-power impulse magnetron sputtering and its applications

Arutiun P. Ehiasarian

doi:10.1351/PAC-CON-09-10-43

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High-power impulse magnetron sputtering and its applications

Arutiun P. Ehiasarian

Veröffentlicht/Copyright: 20. April 2010

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Aus der Zeitschrift Pure and Applied Chemistry Band 82 Heft 6

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APA
Harvard
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Ehiasarian, Arutiun P.. "High-power impulse magnetron sputtering and its applications" Pure and Applied Chemistry, vol. 82, no. 6, 2010, pp. 1247-1258. https://doi.org/10.1351/PAC-CON-09-10-43

Ehiasarian, A. (2010). High-power impulse magnetron sputtering and its applications. Pure and Applied Chemistry, 82(6), 1247-1258. https://doi.org/10.1351/PAC-CON-09-10-43

Ehiasarian, A. (2010) High-power impulse magnetron sputtering and its applications. Pure and Applied Chemistry, Vol. 82 (Issue 6), pp. 1247-1258. https://doi.org/10.1351/PAC-CON-09-10-43

Ehiasarian, Arutiun P.. "High-power impulse magnetron sputtering and its applications" Pure and Applied Chemistry 82, no. 6 (2010): 1247-1258. https://doi.org/10.1351/PAC-CON-09-10-43

Ehiasarian A. High-power impulse magnetron sputtering and its applications. Pure and Applied Chemistry. 2010;82(6): 1247-1258. https://doi.org/10.1351/PAC-CON-09-10-43

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Online erschienen: 2010-4-20

Erschienen im Druck: 2010-4-20

Artikel in diesem Heft

Preface
Microplasma generation in artificial media and its potential applications
Optical diagnostics in dielectric barrier discharges at atmospheric pressure
Diagnostic-based modeling on a micro-scale atmospheric-pressure plasma jet
Atmospheric-pressure plasma sources: Prospective tools for plasma medicine
Plasma functionalization of textiles: Specifics and possibilities
High-power impulse magnetron sputtering and its applications
Synthesis of carbon nanotubes by plasma-enhanced chemical vapor deposition in an atmospheric-pressure microwave torch
Dust particles in low-pressure plasmas: Formation and induced phenomena
Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas
Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas
Liquid-phase laser ablation
Plasma catalysis: A solution for environmental problems
Innovative in-flight glass-melting technology using thermal plasmas

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https://doi.org/10.1351/PAC-CON-09-10-43

Schlagwörter für diesen Artikel

coating adhesion; high-density microstructure films; high-power impulse magnetron sputtering; local epitaxial growth; physical vapor deposition

Artikel in diesem Heft

Preface
Microplasma generation in artificial media and its potential applications
Optical diagnostics in dielectric barrier discharges at atmospheric pressure
Diagnostic-based modeling on a micro-scale atmospheric-pressure plasma jet
Atmospheric-pressure plasma sources: Prospective tools for plasma medicine
Plasma functionalization of textiles: Specifics and possibilities
High-power impulse magnetron sputtering and its applications
Synthesis of carbon nanotubes by plasma-enhanced chemical vapor deposition in an atmospheric-pressure microwave torch
Dust particles in low-pressure plasmas: Formation and induced phenomena
Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas
Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas
Liquid-phase laser ablation
Plasma catalysis: A solution for environmental problems
Innovative in-flight glass-melting technology using thermal plasmas