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A quantitative description of fission-track etching in apatite

  • Carolin Aslanian , Raymond Jonckheere ORCID logo EMAIL logo , Bastian Wauschkuhn and Lothar Ratschbacher
Published/Copyright: April 24, 2021
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Abstract

We measured the apatite etch rate vR in 5.5 M HNO3 at 21 °C as a function of orientation. Results for Durango apatite evidence that vR varies by a factor >5 with angle to the c-axis. Our measurements also provided track etch rates vT and surface etch rates vS. However, these cannot be combined for calculating track etching or counting efficiencies. By inserting the measured etch rates in a recent model, we calculate the geometries and dimensions of surface tracks in different apatite faces. The proposed model must be recalibrated for different etching protocols and adapted for other minerals. We submit that the new model justifies reviewing track counting efficiencies based on the existing (vB-vT) etch model. We anticipate that this will have an effect on practical aspects of fission track dating. Single-track step-etch data show that the confined track lengths increase with etch time at a decreasing average rate vL that differs from the track etch rate vT and the apatite etch rate vR. Both vT and vL exhibit large track-to-track differences that produce irreducible length variation related to the latent-track structure resulting from formation and annealing. Step etching and track width measurements are effective for reducing or eliminating procedure-related artifacts from track length data, and so for accessing more fundamental track properties.


† Special collection papers can be found online at http://www.minsocam.org/MSA/AmMin/special-collections.html.


Acknowledgments and funding

Research funded by the German Research Council (DFG project Jo 358/4-1). We are much indebted to R. Ketcham and A.J.W. Gleadow for their professional reviews, which greatly improved our manuscript.

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Received: 2020-05-17
Accepted: 2020-08-19
Published Online: 2021-04-24
Published in Print: 2021-04-27

© 2021 Walter de Gruyter GmbH, Berlin/Boston

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