Investigations on Chemo-Mechano Stabilities of the Molybdenum Thin Films Deposited by DC-Sputter Technique

Abstract

This paper reports the chemical and mechanical stability of Molybdenum (Mo) thin films deposited by direct current magnetron sputtering technique onto soda lime glass substrates. Mo thin films were deposited at various Ar (working) gas pressures to get optimized structural, morphological, adhesive and electrical properties. Mo thin films were further characterized by field emission scanning electron microscope (FE-SEM), X-ray diffraction, Hall measurements and the cross hatch tape test. To study their chemical stability the prepared Mo thin films were further dipped in acetic acid and ammonia solution for 6 h. Mechanical stability of Mo thin films was tested by high speed ultrasonication for an hour. Both the chemical and mechanical stability studies showed that Mo thin films were highly stable since morphology, adhesion and electrical properties did not alter significantly. FE-SEM results showed that the grain size of the chemo-mechano stability tested Mo thin films remained significantly similar with an unimportant effect on the film thickness. Electrical properties showed that electrical resistivity and hall mobility for as-deposited Mo thin films were 2.7 · 10^–5 Ω cm and 5.1 cm²/Vs, respectively and remained nearly stable regardless of chemical and mechanical treatment. All of the films passed the cross hatch tape test and showed an excellent adhesion with glass substrates. The wettability investigations showed that all the Mo thin films were hydrophilic in nature and having contact angles in the range of 35^○ to 40^○.