Metrological nanopositioning combined with two-photon direct laser writing
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Laura Mohr-Weidenfeller
Dr.-Ing. Laura Mohr-Weidenfeller is postdoctoral researcher at the Institute for Micro- and Nanotechnologies (IMN) MacroNano® at the Ilmenau University of Technology. Main research activities: two-photon direct laser writing, micro-and nanofabrication, silicon-ceramic composite substrates.
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Martin Hofmann
Dr.-Ing. Martin Hofmann is postdoctoral researcher at the Institute for Micro- and Nanotechnologies (IMN) MacroNano® at the Ilmenau University of Technology. Main research activities: field-emission scanning probe lithography, micro-and nanofabrication.
Dipl.-Ing. Oliver Birli is researcher at the Institute for Process Measurement and Sensor Technology at the Ilmenau University of Technology. Main research activities: nanometrology, nanopositioning and nanomeasuring.
Annika-Verena Häcker is doctoral researcher at the Institute for Process Measurement and Sensor Technology at the Ilmenau University of Technology. Main research activities: two-photon direct laser writing, nanopositioning and nanomeasuring, controlling.
Prof. Dr. rer. nat. Carsten Reinhardt is Head of the Department of Applied Physics and Photonics at Bremen University of Applied Sciences. Main research activities: two-photon direct laser writing, nanophotonics, fiber optics, metamaterials, plasmonics.
Prof. Dr.-Ing. habil. Eberhard Manske is head of department at the Institute for Process Measurement and Sensor Technology at the Ilmenau University of Technology. Main research activities: laserinterferometric measurement and sensor technology, nanopositioning and nanomeasuring.
Abstract
The extension of nanopositioning and nanomeasuring machines (NPM-machines) to fabrication machines by using a femtosecond laser for the implementation of direct laser writing by means of two-photon absorption (2PA) is a promising approach for cross-scale metrological fabrication in the field of lithographic techniques [24]. To this end, a concept for integrating two-photon technology into an NPM machine was developed and implemented, followed by a characterization of the system and targeted investigations to provide evidence for the synergy of the two techniques. On this basis, a new approach to high-throughput micro- and nano-fabrication was developed and investigated, demonstrating new possibilities in cross-scale, high-precision manufacturing [6]. This mix-and-match approach is based on a combination of 2PA laser writing with field emission lithography to fabricate masters for subsequent nanoimprint lithography. Not only the advantages of the large positioning range of the NMM-1 could be highlighted, but also the advantages resulting from the highly accurate positioning. A systematic reduction of the distance between two adjacent lines resulted in a minimum photoresist width of less than
Zusammenfassung
Die Erweiterung von Nanopositionier- und Nanomessmaschinen (NPM-Maschinen) zu Fabrikationsmaschinen durch den Einsatz eines Femtosekundenlasers zur Realisierung des direkten Laserschreibens mittels Zwei-Photonen-Absorption (2PA) ist ein vielversprechender Ansatz für die skalenübergreifende Fertigung im Bereich der lithografischen Techniken [24]. Zu diesem Zweck wurde ein Konzept für die Integration der Zwei-Photonen-Technologie in eine NPM-Maschine entwickelt und implementiert, gefolgt von einer Charakterisierung des Systems und gezielten Untersuchungen, um die Synergie der beiden Techniken nachzuweisen. Auf dieser Grundlage wurde ein neuer Ansatz für Mikro- und Nanofabrikation mit hohem Durchsatz entwickelt und untersucht, was neue Möglichkeiten in der skalenübergreifenden und hochpräzisen Fertigung aufzeigt [6]. Dieser Mix-and-Match-Ansatz basiert auf einer Kombination aus 2PA-Laserschreiben mit Feldemissionslithographie zur Herstellung von Vorlagen für die anschließende Nanoimprint-Lithographie. Nicht nur die Vorteile des großen Positionierbereichs des NMM-1 können dadurch demonstriert werden, sondern auch die Vorteile die sich aus der hochgenauen Positionierung ergeben. Eine systematische Verringerung des Abstands zwischen zwei benachbarten Linien führte zu einer minimalen Photoresistbreite von weniger als 30 nm [16], die zu den kleinsten Abständen zwischen zwei lasergeschriebenen Linien zugeordnet werden können [4], [10], [20]. Der Abstand der Linien von etwa 1,695 μm bei einer numerischen Apertur von 0,16 und einer Wellenlänge von 801 nm beträgt nur etwa 56 % der für den Zwei-Photonen-Prozess erweiterten Rayleigh-Beugungsgrenze. Nach unserem besten Wissen wurde zum ersten Mal eine Resistbreite weit unterhalb der Beugungsgrenze mit konventionellem Zwei-Photonen-Laserschreiben in positivem Photoresist realisiert.
Funding source: Deutsche Forschungsgemeinschaft
Award Identifier / Grant number: MU 3171/2-1 + 6-1
Award Identifier / Grant number: SCHA 632/19-1 + 27-1
Award Identifier / Grant number: HO 2284/4-1 + 12-1
Award Identifier / Grant number: GRK 2182
Funding statement: Support by the Center of Micro- and Nanotechnologies (ZMN) (DFG RIsources reference: RI00009), a DFG-funded core facility (Grant No. MU 3171/2-1 + 6-1, SCHA 632/19-1 + 27-1, HO 2284/4-1 + 12-1) of the TU Ilmenau, is gratefully acknowledged. The authors gratefully acknowledge support by the Deutsche Forschungsgemeinschaft (DFG, http://dx.doi.org/10.13039/501100001659) in the framework of Research Training Group “Tip- and laser-based 3D Nanofabrication in extended macroscopic working areas” (GRK 2182) at the Technische Universität Ilmenau, Germany.
About the authors
Dr.-Ing. Laura Mohr-Weidenfeller is postdoctoral researcher at the Institute for Micro- and Nanotechnologies (IMN) MacroNano® at the Ilmenau University of Technology. Main research activities: two-photon direct laser writing, micro-and nanofabrication, silicon-ceramic composite substrates.
Dr.-Ing. Martin Hofmann is postdoctoral researcher at the Institute for Micro- and Nanotechnologies (IMN) MacroNano® at the Ilmenau University of Technology. Main research activities: field-emission scanning probe lithography, micro-and nanofabrication.
Dipl.-Ing. Oliver Birli is researcher at the Institute for Process Measurement and Sensor Technology at the Ilmenau University of Technology. Main research activities: nanometrology, nanopositioning and nanomeasuring.
Annika-Verena Häcker is doctoral researcher at the Institute for Process Measurement and Sensor Technology at the Ilmenau University of Technology. Main research activities: two-photon direct laser writing, nanopositioning and nanomeasuring, controlling.
Prof. Dr. rer. nat. Carsten Reinhardt is Head of the Department of Applied Physics and Photonics at Bremen University of Applied Sciences. Main research activities: two-photon direct laser writing, nanophotonics, fiber optics, metamaterials, plasmonics.
Prof. Dr.-Ing. habil. Eberhard Manske is head of department at the Institute for Process Measurement and Sensor Technology at the Ilmenau University of Technology. Main research activities: laserinterferometric measurement and sensor technology, nanopositioning and nanomeasuring.
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- Metrological nanopositioning combined with two-photon direct laser writing
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Articles in the same Issue
- Frontmatter
- Editorial
- XXXV. Messtechnisches Symposium des AHMT
- Beiträge
- Funktionsprinzip und Anwendung der Kraftkompensationsmessmethode für miniaturisierte hydrogelbasierte Sensoren
- Auslegung neuartiger Transferkörper für die Kalibrierung von Massenormalen
- Lamb wave based approach to the determination of acoustic material parameters
- Metrological nanopositioning combined with two-photon direct laser writing
- Investigation of measurement data of low-coherence interferometry at tilted surfaces in the 3D spatial frequency domain
- Erfassung der Schmelzbadfläche mit Korrektur der Perspektive zur Prozessregelung eines Wire and Arc Additive Manufacturing
- Wear volume estimation for a journal bearing dataset
- Scalable multi-distance measurement approach for the optical assessment of tooth-individual shape parameters of large gearings
