TiO2 Nano-cluster Thin Films by Dense Plasma Focus and Ion Implantation Effect on its Photocatalytic Activity
-
G. Macharaga
,
R.S. Rawat
Abstract
Titanium dioxide (TiO2) nano-clusters of average size 120 nm in the form of thin films were prepared using a repetitive dense plasma focus (DPF) device at room temperature. The films were deposited on silicon substrate at a distance of 25 cm from the anode top. A total of 100 DPF deposition shots were used to prepare the films, and the average thickness of the prepared film was about 100 nm. The thin films containing the TiO2 nano-clusters were characterized by scanning electron microscopy (SEM), x-ray diffraction (XRD), and x-ray photoelectron spectroscopy (XPS). On annealing at 400 °C, the nano-cluster thin films showed a predominant anatase phase. Nitrogen and carbon ion implantation of the TiO2 nano-clusters were achieved using a single shot dense plasma focus device using nitrogen and methane as working gases respectively. Contrary to the expected results, under the given experimental conditions, the ion implanted nano-clusters showed a lower photo-catalytic activity than the as-prepared TiO2 owing to the destruction of the surface structure by high energy high flux ions.
© 2016 by Walter de Gruyter Berlin/Boston
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