The consequences of Petzval correction in lithographic designs
-
David Shafer
David Shafer has headed David Shafer Optical Design, in Fairfield, CT, since 1980. Prior to that, he spent 15 years at Itek Corp., Honeywell Electro-Optics Center, and Perkin-Elmer Corp. Much of his design work has been in lithographic systems and semiconductor inspection systems. He attended the Institute of Optics at the University of Rochester from 1961 to 1966. He has published extensively and has over 125 patents.
Abstract
Several design examples show how correcting Petzval curvature in high NA lithographic designs leads to much of the design complexity. There are two cases in which much simpler designs are possible, neither of them practical with today’s technology. One is that of a curved object and/or image system, where no attempt at all is made to control Petzval curvature. The other case is where a diffractive surface is used in the design, which allows Petzval to be easily corrected in relatively simple designs. A very simple 1.1 NA all-refractive immersion design is shown that uses one diffractive surface.
About the author
David Shafer has headed David Shafer Optical Design, in Fairfield, CT, since 1980. Prior to that, he spent 15 years at Itek Corp., Honeywell Electro-Optics Center, and Perkin-Elmer Corp. Much of his design work has been in lithographic systems and semiconductor inspection systems. He attended the Institute of Optics at the University of Rochester from 1961 to 1966. He has published extensively and has over 125 patents.
References
[1] D. Shafer, SPIE, 0766, 2–9 (1987).Suche in Google Scholar
[2] W. C. Sweatt, JOSA 67, 808–808 (1977).Suche in Google Scholar
[3] D. Shafer, IODC 22, 459 (1994).10.1016/0304-422X(94)90021-3Suche in Google Scholar
[4] H. Feldmann, A. Dodoc, A. Epple, H. Rostalski, D. R. Shafer, W. Ulrich, SPIE 5962–5932 (2005).Suche in Google Scholar
©2015 THOSS Media & De Gruyter
Artikel in diesem Heft
- Cover and Frontmatter
- Editorial
- Reviewer recognition and new plans for 2015
- Views
- European Photonics Industry Back to Growth in 2014
- Lenses for film and television: an international survey
- Community
- Community News
- Conference Calendar
- Topical issue: Micro-optics for industrial applications
- Editorial
- Micro-optics for industrial applications
- Tutorial
- High-end spectroscopic diffraction gratings: design and manufacturing
- Review Articles
- From regular periodic micro-lens arrays to randomized continuous phase profiles
- Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners
- Research Articles
- Polarizing and angle-sensitive color filter in transmittance for security feature applications
- Micro-optics in lighting applications
- Letter
- Optical simulation of microstructured surfaces
- Tutorial
- The consequences of Petzval correction in lithographic designs
- Research Article
- Methods for describing illumination colour uniformities
Artikel in diesem Heft
- Cover and Frontmatter
- Editorial
- Reviewer recognition and new plans for 2015
- Views
- European Photonics Industry Back to Growth in 2014
- Lenses for film and television: an international survey
- Community
- Community News
- Conference Calendar
- Topical issue: Micro-optics for industrial applications
- Editorial
- Micro-optics for industrial applications
- Tutorial
- High-end spectroscopic diffraction gratings: design and manufacturing
- Review Articles
- From regular periodic micro-lens arrays to randomized continuous phase profiles
- Micro-optics and lithography simulation are key enabling technologies for shadow printing lithography in mask aligners
- Research Articles
- Polarizing and angle-sensitive color filter in transmittance for security feature applications
- Micro-optics in lighting applications
- Letter
- Optical simulation of microstructured surfaces
- Tutorial
- The consequences of Petzval correction in lithographic designs
- Research Article
- Methods for describing illumination colour uniformities
