Control Charts for Particles in the Semiconductor Manufacturing Process
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Hironobu Kawamura
Abstract
Particles such as dust have serious negative effects on yield, performance and reliability in the semiconductor manufacturing process. As a result, there is the need to control particles in the manufacturing process, which often is done by means of control charts. The c-chart is a control chart based on the Poisson distribution generally used to monitor the number of defects in statistical process control. However, if the c-chart is used in a semiconductor manufacturing process, the process will often be declared out-of-control although the process is in-control, because the number of particles on a wafer does not follow a Poisson distribution. In this study, we assume that the particle distribution follows a negative binomial distribution, and propose a procedure for the use of a control chart that includes outlier removal. The usefulness of this proposal is then shown by simulation, numerical analysis, and application of the proposed steps to real data.
© Heldermann Verlag
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- One-sided and Two-sided Critical Values for Dixon's Outlier Test for Sample Sizes up to n = 30
- Exact Distributions of Products of Certain Random Variables
- Two Old Statistical Methods in a New Stochastic Outfit
- Optimal Maintenance/Replacement-Policy for Deteriorating Systems under Two-Phase Maintenance Strategy
- Bounds for Quantile-Based Risk Measures of Functions of Dependent Random Variables
- The Distribution of the Profile of Aluminium Coil
- A Note on the Efficiency of Nonparametric Control Chart for Monitoring Process Variability
- Control Charts for Particles in the Semiconductor Manufacturing Process
- Statistical Sampling Strategies for Geometric Tolerance Inspection by CMM
- A Critical Note on the Guide to the Expression of Uncertainty in Measurement (GUM)
Articles in the same Issue
- One-sided and Two-sided Critical Values for Dixon's Outlier Test for Sample Sizes up to n = 30
- Exact Distributions of Products of Certain Random Variables
- Two Old Statistical Methods in a New Stochastic Outfit
- Optimal Maintenance/Replacement-Policy for Deteriorating Systems under Two-Phase Maintenance Strategy
- Bounds for Quantile-Based Risk Measures of Functions of Dependent Random Variables
- The Distribution of the Profile of Aluminium Coil
- A Note on the Efficiency of Nonparametric Control Chart for Monitoring Process Variability
- Control Charts for Particles in the Semiconductor Manufacturing Process
- Statistical Sampling Strategies for Geometric Tolerance Inspection by CMM
- A Critical Note on the Guide to the Expression of Uncertainty in Measurement (GUM)