Home Technology Intermetallic compounds formed during the soldering reactions of eutectic Sn–9Zn with Cu and Ni substrates
Article
Licensed
Unlicensed Requires Authentication

Intermetallic compounds formed during the soldering reactions of eutectic Sn–9Zn with Cu and Ni substrates

  • Y. C. Chan , M. Y. Chiu and T. H. Chuang EMAIL logo
Published/Copyright: December 27, 2021

Abstract

The efforts of this study aim to investigate the morphology and growth kinetics of the intermetallic compounds formed during the interfacial reactions of eutectic Sn–9Zn solders with Cu and Ni substrates at temperatures ranging from 250 to 350 °C. Experimental results show that the intermetallic growth rate at the Sn–9Zn/Cu interface is much higher than that at the Sn– 9Zn/Ni interface. Kinetics analyses indicate that both types of interfacial reactions are diffusion-controlled. The activation energies for the intermetallic growth at the Sn–9Zn/Cu and Sn– 9Zn/Ni interfaces are 8.2 and 68.9 kJ/mol, respectively. The formation mechanisms of the intermetallic compounds during the soldering reactions at both interfaces are clarified by using a Ta thin film as diffusion marker.


Prof. T. H. Chuang Department of Materials Science and Engineering National Taiwan University 1. Roosevelt Rd., Sec. 4, Taipei 106, Taiwan Tel.: +886 2 2392 9635 Fax: +886 2 2363 4562

References

1 Lee, N.C.: Adv. Microelectron. 26 (1999) 29.10.1016/S0026-2714(98)00159-0Search in Google Scholar

2 Tu, K.N.; Zeng, K.: Mater. Sci. Eng. R 34 (2001) 1.10.1016/S0927-796X(01)00029-8Search in Google Scholar

3 Mei, Z.; Morris, Jr. J.W.: J. Electron. Mater. 21 (1992) 599.10.1007/BF02655427Search in Google Scholar

4 Chada, S.; Fourmelle, R.A.; Laub, W.: J. Electron. Mater. 29 (2000) 1214.10.1007/s11664-000-0015-6Search in Google Scholar

5 Lee, Y.G.; Duh, J.G.: Mater. Characterization 42 (1999) 143.10.1016/S1044-5803(98)00059-XSearch in Google Scholar

6 Pan, T.Y.; Dlair, H.D.; Nicholson, J.M.; Oh, S.W.: Adv. Electron. Packaging 19 (1997) 1347.Search in Google Scholar

7 Chen, C.; Ho, C.E.; Lin, A.H.; Luo, G.L.; Kao, C.R.: J. Electron. Mater. 29 (2000) 1200.10.1007/s11664-000-0013-8Search in Google Scholar

8 Harris, P.: Soldering and Surf. Mount Technol. 11 (1999) 46.10.1108/09540919910293874Search in Google Scholar

9 Lee, H.M.; Yoon, S.W.; Lee, B.J.: J. Electron. Mater. 27 (1998) 1161.10.1007/s11664-998-0065-8Search in Google Scholar

10 Yoon, S.W.; Soh, J.R.; Lee, H.M.; Lee, B.J.: Acta Mater. 45 (1997) 951.10.1016/S1359-6454(96)00253-4Search in Google Scholar

11 Yoon, S.W.; Choi, W.K.; Lee, H.M.: Scripta Mater. 40 (1999) 327.10.1016/S1359-6462(98)00414-XSearch in Google Scholar

12 Suganuma, K.; Niihara, K.: J. Mater. Research 13 (1998) 2859.10.1557/JMR.1998.0391Search in Google Scholar

Received: 2001-11-06
Published Online: 2021-12-27

© 2002 Carl Hanser Verlag, München

Downloaded on 31.12.2025 from https://www.degruyterbrill.com/document/doi/10.3139/ijmr-2002-0021/pdf
Scroll to top button