Article
Open Access
Ion flux's pressure dependence in an asymmetric capacitively coupled rf discharge in NF3
-
Emil Mateev
and
Ivan Zhelyazkov
Published/Copyright:
March 1, 2004
Published Online: 2004-3-1
Published in Print: 2004-3-1
© 2004 Versita Warsaw
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Keywords for this article
capacitive discharges;
ion fluxes;
stochastic heating;
52.40.Kh;
52.70.Gw;
52.80.Pi
Creative Commons
BY-NC-ND 3.0
Articles in the same Issue
- Ion flux's pressure dependence in an asymmetric capacitively coupled rf discharge in NF3
- Statistical and neural net methods for automatic glaucoma diagnosis determination
- Is there the radion in the RS2 model?
- Interactions of charged dust particles in clouds of charges
- Mass-transport driven by surface instabilities in metals under reactive plasma/ion beam treatment at moderate temperature
- Thermodynamic model of crystallization and melting of small particles
- Glass-forming ability and thermal stability of Fe62Nb8−xZrxB30 and Fe72Zr8B20 amorphous alloys?
- NMR study of heterogeneity in pyridine-N-oxide...HCl crystal
- On the mechanism of the runaway of electrons in a gas: The upper branch of the paschen curve
- Fowler-nordheim tunnelling in Au−TiO2−Ag film structures
- Fullerenes as polyradicals
- Industrial challenges for numerical simulation of crystal growth
- A system of units compatible with geometry
- Critical fields of a superconducting cylinder
