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Development of a Traceable Atomic Force Microscope (Entwicklung eines metrologischen Rasterkraftmikroskops)

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Published/Copyright: September 25, 2009
tm - Technisches Messen
From the journal Volume 69 Issue 11

In order to realize the traceability of Atomic Force Microscopes (AFM), we have designed a Traceable Atomic Force Microscope (TAFM) to calibrate the pitch standards. The TAFM consists of an atomic force microscope, a 3-axis active compensation flexure stage, two differential plane mirror laser interferometers, a L-shape mirror, a vibration isolator, and a Super-INVAR metrology frame. A test specimen was laid onto the same plane of the laser interferometers to eliminate the Abbe-offset. The x,y movements were controlled by a flexure stage and the displacements were recorded by laser interferometers while the z movement was controlled by the AFM cantilever and the displacement was recorded by a capacitive sensor. A water circulatory was used to maintain the TAFM at 20 ºC. Measuring results of a standard pitch sample show that this TAFM can be used for measuring standards. The standard uncertainty of pitch measurement with a nominal value of 292 nm was 1.2 nm.

Es wurde ein metrologisches Rasterkraftmikroskop (TAFM) für die Kalibrierung von Strukturbreitennormalen entwickelt. Die wichtigsten Komponenten des TAFM sind das Rasterkraftmikroskop, ein dreiachsiges Positioniersystem, zwei Differentialplanspiegelinterferometer, ein L-förmiger Spiegel, ein schwingungsgedämpfter Tisch und der Rahmen aus Invar. Die x-, y-Bewegungen des Positioniersystems werden mit den Differentialplanspiegelinterferometern gemessen; die z-Bewegungen erfasst das Rasterkraftmikroskop. Das Messobjekt und die Interferometer sind so angeordnet, dass Abbefehler 1. Ordnung vermieden werden. Die Messungen an 292-nm-Strukturbreitennormalen ergaben eine Standardunsicherheit von 1.2 nm.

Published Online: 2009-09-25
Published in Print: 2002-11
Downloaded on 15.4.2026 from https://www.degruyterbrill.com/document/doi/10.1524/teme.2002.69.11.483/html
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