Electroplating/electrodissolution/recovery cycle for rhodium target used for an industrial scale cyclotron production of palladium-l03
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Mahdi Sadeghi
, Hossein Afarideh , Gholamreza Raisali and P. van den Winkel
Summary
Electrodeposition of rhodium metal on a copper backing was performed in acidic sulfate media using RhCl3 · 3 H2O, Rh2(SO4)3 (recovered from hydrochloric acid solution) and also the commercially available Rhodex plating baths. This work describes the development of a high current density (2.4 A·cm-2) electrodissolution system that allows solubilisation of rhodium fragments, powder and pieces of foils and wires in the presence of hydrochloric and chlorine gas. Solvent-solvent extraction of no-carrier-added 103Pd from the irradiated rhodium target with a-furyldioxime into chloroform under the influence of hydrochloric acid concentration was investigated. The extraction yield was 85.3% for a single extraction with 0.37 M HCl, and 103Pd was more than 99% pure.
© by Oldenbourg Wissenschaftsverlag, München
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Articles in the same Issue
- Attempts to chemically investigate element 112
- Distribution studies on Th(IV), U(VI) and Pu(IV) using tri-n-butylphosphate and N,N-dialkyl amides
- Solvent extraction studies on Th(IV) and U(VI) using PolyEthylene Glycol (PEG) based aqueous biphasic system (ABS) with 18-crown-6
- The aqueous complexation of thorium with citrate under neutral to basic conditions
- Production of [124I]-iodine on an 11 MeV cyclotron
- Electroplating/electrodissolution/recovery cycle for rhodium target used for an industrial scale cyclotron production of palladium-l03
- Effects of phosphate and ionic strength upon uranium(VI) sorption onto alumina as a function of pH
- Adsorption of lanthanum to goethite in the presence of gluconate