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On the relation between electrical and electro-optical properties of tunnelling injection quantum dot lasers

  • Vissarion Mikhelashvili , Lior Gal , Guy Seri , Sven Bauer , Igor Khanonkin , Ori Eyal , Amnon Willinger ORCID logo , Johann Reithmaier and Gadi Eisenstein EMAIL logo
Published/Copyright: January 31, 2023
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Abstract

We present a comprehensive study of the temperature dependent electronic and optoelectronic properties of a tunnelling injection quantum dot laser. The optical power-voltage (P optV) characteristics are shown to be correlated with the current-voltage (IV) and capacitance-voltage (CV) dependencies at low and elevated temperatures. Cryogenic temperature measurements reveal a clear signature of resonant tunnelling manifested in periodic responses of the IV and P optV characteristics, which diminish above 60 K. The CV characteristics reveal a hysteresis stemming from charging and de-charging of the quantum dots, as well as negative capacitance. The latter is accompanied by a clear peak that appears at the voltage corresponding to carrier clamping, since the clamping induces a transient-like effect on the carrier density. CV measurements lead also to a determination of the dot density which is found to be similar to that obtained from atomic force microscopy. CV measurements enable also to extract the average number of trapped electrons in each quantum dot which is 0.95. As the important parameters of the laser have signatures in the electrical and electro-optical characteristics, the combination serves as a powerful tool to study intricate details of the laser operation.

1 Introduction

The most fundamental limitation of dynamic properties in all semiconductor lasers is the optical gain nonlinearity [1]. The gain nonlinearity originates from various physical processes including spectral and spatial hole burning and most important, hot carrier injection to the laser oscillating state. Hot carrier injection can in principle be overcome using the concept of tunnelling injection (TI) [18] which makes use of a quantum well (QW) serving as a cold carrier reservoir that feeds the laser oscillating state via a tunnelling process. Bhattacharya et al. [3] reported a TI Quantum Dot (QD) laser with a bandwidth of approximately 22 GHz. TI also improves temperature characteristics of QD lasers as demonstrated by Klopf et al. [9].

In TI QD lasers, carrier injection from the reservoir is achieved by hybridization between the QW confined state and an excited state of the QDs [57] followed by fast relaxation to the QD ground state. The wide, inhomogeneously broadened spectrum of the QDs ensures that the QW confined state is always aligned with an excited state of some QD. A key requirement is that the transition energy of the QDs that hybridize is close to the gain peak where laser oscillation occurs. Otherwise, the TI processes become a loss mechanisms and hampers the laser performance [8].

This paper addresses the manner by which TI impacts the electrical and electro-optical properties of TI QD lasers. The voltage dependence of current (IV), capacitance (CV), and optical power (P optV) are found to be strongly correlated when tested over a wide range of temperatures, from 4 K to 290 K. The comprehensive study leads to several important findings. These include the discretization of the dot layers as well as direct evidence of resonant tunnelling both of which are observed, at low temperatures, in the current and optical power dependencies on voltage. CV characteristics reveal hysteresis and negative capacitance which is accompanied by a peak corresponding to carrier clamping. The measured CV enables also to determine the dot density which is similar to that obtained in atomic force microscopy. It also yields the average number of electrons trapped in each QD which is 0.95.

The combined electrical and electro-optical characteristics make for a powerful set of experimental tools for detailed understanding of carrier transport and radiative processes in TI QD and other types of semiconductor lasers.

2 Experimental results and discussion

The TI QD laser comprised six layers of highly uniform InAs QDs with a density of 3 ⋅ 1010  cm−2. Each QD layer is accompanied by a 3 nm wide QW separated from the QDs by a 2 nm thick InAlGaAs layer. The homogeneity of the QD layers is characterized, by convention, via the photo luminescence line width at 10 K. For a single layer, the QDs exhibit a width of 17 meV while for a stack of 6 layers it is 35 meV [10]. These are narrower by a factor of 4–5 compared to any reported QDs in any material system. Figure 1 describes the energy band diagrams of the TI QD laser and a reference QD laser that has no TI region. An enlarged view of the active regions is shown in lower part of the figure. The laser cavity was formed by a 2 μm wide, 330 μm long ridge waveguide whose back facet reflectivity was larger than 90%, obtained by multi-layer dielectric coating comprising a three-layer stack of SiO2 and Si.

Figure 1: 
Energy band diagram of TI QD laser (left) and a conventional, reference QD laser (right). The lower parts are enlarged views of the respective active regions.
Figure 1:

Energy band diagram of TI QD laser (left) and a conventional, reference QD laser (right). The lower parts are enlarged views of the respective active regions.

2.1 Current-voltage characteristics

Current-voltage characterizations, measured at different temperatures between 4 K and 290 K, are shown in Figure 2(a). The calculated power exponent parameter, α = d ln I / d ln V [11] dependence on bias (αV) and temperature is shown in Figure 2(b)–(f).

Figure 2: 
Temperature dependent (a) I–V, and (b)–(f) α–V characteristics. The dotted lines indicate the location of the corresponding voltages of the evolving discontinuity in Figure 2(b)–(f). Roman numerals mark the maxima and inflections points on the α–V curves.
Figure 2:

Temperature dependent (a) IV, and (b)–(f) αV characteristics. The dotted lines indicate the location of the corresponding voltages of the evolving discontinuity in Figure 2(b)–(f). Roman numerals mark the maxima and inflections points on the αV curves.

At a very low forward bias, α exhibits a large peak that is associated with the diffusive component of the carrier flow from the cladding layers to the QW, which is highly temperature dependent. Following this large peak, at low temperatures, the αV curve reveals an oscillatory nature which reflects discretization of the QD layers; there is one bump in the curve for each QD layer. At 3.05 V and at a temperature of 4 K, α exhibits a strong peak at the end of which appears a distinct discontinuity, which indicates carrier clamping at threshold [12]. Comparing the results with a reference QD laser having no TI region reveals a similar discretization at 4 K with the first large peak missing as there is no QW layer.

The bumps in the αV curves are related to the step-like increment of the current with applied voltage. It is due to Coulomb blockade originating from the potential of fully charged dots in each layer, which opposes the applied bias, and also from a tunnelling process between separate QW–QD layer pairs. Each section of the IV and αV curves can be described by the theory of Asryan [13, 14] with the inclusion of various standard tunnelling mechanisms [1518].

At elevated temperatures, the bumps in the αV characteristics disappear since broadening of the homogeneous linewidth eliminates the discrete nature of the QD layers. A thermally activated branch of the IV characteristic is dominated, at the lowest bias regime, by diffusion-recombination, in accordance with the classical Shockley-Reed-Hall model [19, 20]. At 230 K and 290 K, carrier transport is dominated by tunnelling at a somewhat increased voltage corresponding to the second and third peaks in Figure 2(e)–(f). This behavior results from the strong temperature dependence of the ideality factor and slope of the IV characteristics, and the weak dependence of the saturation current [21].

A high-resolution αV curve (with a 1 mV voltage step) measured at 4 K is shown in the blue trace of Figure 3(a) for the voltage range of 2.3 V–3 V. It reveals well-separated, periodic, narrow peaks which are superimposed on the bumps. These peaks are a direct imprint of the actual TI process, resembling classical resonant tunnelling. Since the QD ensemble is inhomogeneous, different voltages cause hybridization of excited states belonging to different QD groups (clusters) with the confined state of the QW injector [57], yielding successive resonant tunnelling events [22]. The αV curve for a reference QD laser with no TI region is shown in the red trace of Figure 3(a) and naturally shows no resonances. The two yellow circles shown in Figure 3(a) represent the two respective threshold voltages.

Figure 3: 
Temperature and bias dependent α. (a) High resolution α–V curves at 4 K measured with voltage steps of 1 mV for a TI QD laser and a conventional QD laser. The two yellow circles represent the two threshold voltages and the inset shows an enlarged view of the tunnelling resonances. (b) Evolution with temperature of the fourth and fifth bumps of the α–V curves measured with a voltage step of 10 mV.
Figure 3:

Temperature and bias dependent α. (a) High resolution αV curves at 4 K measured with voltage steps of 1 mV for a TI QD laser and a conventional QD laser. The two yellow circles represent the two threshold voltages and the inset shows an enlarged view of the tunnelling resonances. (b) Evolution with temperature of the fourth and fifth bumps of the αV curves measured with a voltage step of 10 mV.

Figure 4: 
Temperature and bias dependent α and γ. (a) P
opt–V and γ–V characteristics. Comparison of γ–V and α–V dependencies measured at (b) 4 K, and (c) 60 K. (d) High resolution comparison of γ–V and α–V showing an enlarged view of the third, fourth and fifth bumps. The inset in Figure 4(c) shows the γ–V and α–V characteristics at 105 K.
Figure 4:

Temperature and bias dependent α and γ. (a) P optV and γV characteristics. Comparison of γV and αV dependencies measured at (b) 4 K, and (c) 60 K. (d) High resolution comparison of γV and αV showing an enlarged view of the third, fourth and fifth bumps. The inset in Figure 4(c) shows the γV and αV characteristics at 105 K.

The periodic reiteration in Figure 3(a) does not exhibit single peaks, but rather double peaks making a W-like shape where the pairs of peaks are not symmetric relative to the central ones. This is highlighted in the inset of Figure 3(a). The distance between them is roughly 18 mV and 25 mV and their average full width at half maximum are 5.3 mV and 13.2 mV, respectively. The appearance of the W-like shaped peaks stems from the fact that they have a relatively wide energy span since the confined state of the injector QW can hybridize simultaneously with spectrally close excited states belonging to different groups of dots [6, 7] and therefore, resonant tunnelling occurs over a finite spectral range. For the same reason, the width of the peaks is wider than the common spectral width of a single dot at 4 K which is in the μeV range. As the temperature increases, the αV characteristics move to lower voltages and the resonance sharpness diminishes since the homogeneous linewidth of the QDs widens and the overlap between dot clusters increases. This is shown in Figure 3(b) for the fourth and fifth bumps where the resonances disappear at 80 K.

2.2 Power-voltage characteristics

The most basic electro-optical property of a diode laser is usually characterized by P optI measurements. P optV characteristics are not commonly used but they often show more intricate details and are easily correlated with the IV characteristics [21]. The P optV characteristic measured at 4 K is described in Figure 4(a) together with the calculated γV characteristic, ( γ = d ln P opt / d ln V ) [21].

The QD layer discretization is also observed in the γV curve at 4 K which shows the same bumps as in the αV curve except for the absence of the first peak since there is no emission of any kind at the very low bias voltage. The sixth bump is not seen and is replaced by a sharp peak (marked I) at 2.75 V which signifies the threshold voltage. The second large peak (marked II) at 3.05 V coincides with the peak in Figure 2(b). As the temperature rises, these two peaks evolve (see Figure 4(c)). Peak I shifts to the low voltage side, while peak II sharply decreases. Beyond 60 K they coincide and represent a single threshold voltage. This is shown in the inset to Figure 4(c) for 105 K. The main features of the low temperature γV characteristic, in particular the oscillating bumps follow the corresponding features of the αV characteristic. This confirms the direct impact of the resonant tunnelling on the emission process. The oscillations superimposing the bumps in the γV characteristics are somewhat less pronounced compared to the αV curve as seen in Figure 4(d). This is due to the fact that different dot layers contribute differently to the laser emission. Carrier transport effects and an internal field that bends the energy levels yield a non-uniform inversion [23].

The origin of the two peaks in the γV curve is the dot inhomogeneity which is highlighted at low temperatures due to narrowing of the dot’s homogeneous linewidth. This is seen in the bias dependent emitted spectra presented in Figure 5 for a temperature of 6 K.

Figure 5: 
Applied voltage dependent optical spectra measured at 6 K.
Figure 5:

Applied voltage dependent optical spectra measured at 6 K.

At low bias levels (Figure 5(a)), the laser spectrum is that of a standard Fabry–Perot laser. As the bias increases, the spectrum becomes asymmetric and at about 3 V, the laser emits in two spectral regions as seen in Figure 5(b). This is a classical behavior of an inhomogeneously broadened laser [24]. The emergence of the second emitted spectral region coincides with the voltage of the second peak of the γV curve and the discontinuity in the αV characteristic that is the voltage where carrier clamping takes place. As the temperature rises and the homogeneous linewidth increases, the discrete nature of the gain spectrum diminishes and the laser exhibits but one threshold. Correspondingly, the γV curve exhibits a single peak which coincides with the discontinuity in the αV curve, which represents threshold.

2.3 Capacitance voltage characteristics

A full electrical analysis including its correlation to optoelectronic properties requires also a description of the CV characteristics. Such measurements performed at 10 kHz and 1000 kHz are shown in Figure 6 for two temperatures. Under stimulated emission conditions, as the trapping and de-trapping processes in the QDs increase, the CV characteristics exhibit an inductive like nature (known as negative capacitance (NC)) as often seen in light emitting diodes [2528] and QD lasers [29].

Figure 6: 
Temperature dependent C–V characteristics at two frequencies. (a) 10 K, (c) 150 K, (b) and (d), enlarged views at 10 K and 150 K, respectively, of the C–V curves near the hysteresis regions.
Figure 6:

Temperature dependent CV characteristics at two frequencies. (a) 10 K, (c) 150 K, (b) and (d), enlarged views at 10 K and 150 K, respectively, of the CV curves near the hysteresis regions.

The measured capacitance exhibits, for both frequencies, discontinuities at two different voltages what forms a clockwise hysteresis loop. It originates from charging of the QDs when the voltage varies from negative to positive and discharging for the opposite polarity. Figure 6(b) and (d) show enlarged views near the hysteresis region at 10 K and 150 K, respectively. The hysteresis loop formation resembles that of nonvolatile memory type metal–insulator–semiconductor structures or field effect transistors, with embedded metal or semiconductor nanocrystals [30, 31]. The hysteresis loop shifts towards negative bias values as the temperature changes from 10 K and 150 K.

The average QD density can be estimated by the width of the hysteresis loop which is determined, in turn, by the total sum of trapped charges in each QD [32]. Charges accumulated in the QDs induce, under bias, charges with the opposite sign in the semiconductor substrate, what shifts the capacitance to higher voltages. The InAs average dot density is estimated as [32, 33]:

n dot = ε 0 ε tun Δ V C V q ν N d cnt + ε tun 2 ε InP d Q D N Q D

The constants ɛ 0 and q are, respectively, the vacuum permittivity and the elementary charge, while ɛ tun = 13.4 and ɛ InP = 12.4 are the respective dielectric coefficients of the tunnelling layer and the InP substrate layer. d cnt = 2 nm is the barrier layer width between dot layers (playing the role of a control layer [32, 33]), d QD = 1.38 nm (4.7 mono-layers) is the QD mean diameter. There are N = 5 control layers, and N QD = 6 QD layers. We further evaluate the effective number of electrons captured by a single QD using ν = d eff Δ E g [30] where Δ E g = q 2 C self is the Coulomb energy gap and C self = 2πɛ 0 ɛ tun d QD is the self-capacitance. d eff = φ subφ QD is the depth of the effective potential well of the QD region relative to substrate that depends on φ sub = 4.65 eV [34] and φ QD = 4.83 eV [35] which are the respective work functions of the InP substrate and InAs QD layer (the latter is similar to the work function value φ InAs = 4.9 eV [36] for monocrystalline InAs). We obtain that d eff = 0.18 eV, the Coulomb band gap is ΔE g = 0.19 eV and thus ν = 0.95. Considering a hysteresis width of ΔV C V = 0.53 V (based on Figure 6), the average QD density per layer is found to be n dot = 5.3 ⋅ 1010 cm−2 which is close to the estimated density of 3 ⋅ 1010 cm−2 obtained by atomic force microscope [10].

Under a high stimulated emission rate, carrier injection to the QDs is dominated by carriers that originate in the QW reservoir and feed the ground state via a hybrid state and Coulomb scattering. This leads to a fast recombination rate of the ground state electrons which are replenished by carriers that originate in the hybrid state and relax fast to the ground state via Coulomb scattering [57]. In addition to enhancing the radiative recombination, the carriers captured by the QDs, together with the injected holes, affect the capacitance and cause the hysteresis loop whose width is determined by the sum of charges trapped in each QD.

In the forward high-voltage regime, the measured capacitance is essentially the junction capacitance of a modified quasi-P-I-N structure with an effective thickness of its intrinsic layer being lower than at low bias levels. At low bias levels, the thickness comprises the six identical QW, barrier, and QD sublayers. Since the junction capacitance is C = d Q d V j [37] (Q being the charge), and since the differential junction voltages dV j in diodes with monotonically increasing IV characteristics is always positive, the junction capacitance can only be negative for dQ < 0.

While negative capacitance is a rather well known effect in light emitting and laser diodes [26, 27, 37], the peak accompanying the drop in capacitance, seen in Figure 6(a), was not reported previously. Negative dQ results from a combination of various recombination processes. These include mainly a high rate of radiative recombination and non-radiative processes originating from charge trapping in interfacial states at both boundaries of the intrinsic layer [2628]. A second reason for NC accompanied by a sharp peak is penetration of charges stored in the QW reservoir layer to the QDs in accordance with the damped resonant tunnelling model [38]. The peak value of the negative capacitance and the shape of the peak strongly depend on the damping constant and therefore can vary over a wide range.

The NC sharp narrow peak is related to the discontinuity near 3 V in the αV curve and the peaks in the γV characteristics. This correlates the various electrical and electro-optical properties and proves that the electro-optical characteristics have a clear imprint on the electrical properties. The correlations are determined via the temperature dependence of characteristic voltages corresponding to the measured data as described in Figure 7.

Figure 7: 
Temperature dependence of the characteristic voltages.
Figure 7:

Temperature dependence of the characteristic voltages.

In the temperature range of 4 K–60 K, the main threshold voltage equals the peak NC voltage at 1000 kHz. This means that the onset of stimulated emission, and the corresponding tunnelled carrier injection from the QW, as well as the carrier clamping, induce the change in charge density that causes the NC. In this temperature range, the discontinuity in αV, which represents the second threshold occurs at a higher voltage as is the 10 kHz NC peak. Around 100 K, the two threshold voltages merge at the value that corresponds to the NC peak at 1000 kHz. At temperatures up to 150 K, the NC peak voltage at 10 kHz is higher than that at 1000 kHz. This stems from the fact that some traps induce slow non-radiative processes which cannot be sensed at the higher frequency. In the range of 150–200 K, the characteristic voltages at both frequencies are almost the same, but are lower than that threshold voltage. Non-radiative recombination increases above 200 K due to enhancement of phonon induced processes [39], which leads to a decrease in efficiency and an increase in the threshold voltage.

3 Conclusions

In summary, we have presented a comprehensive study of the relationship between optical and electrical characteristics of TI QD lasers. At low temperatures we observed, in the αV characteristics, discretization of the various dot layers as well as a periodic response, both of which are a direct signature of the resonant tunnelling process that feeds carriers from the QW reservoir to the QD ground state via hybridization with a QD excited state. The QD gain inhomogeneity causes, below 60 K, emission at two separate wavelength regimes. These have two different threshold voltages which have a clear imprint on the αV, γV as well as the CV characteristics. The latter show hysteresis loops with a temperature dependent width. At the voltage regime where the laser reaches threshold, the CV curves exhibit an inductive nature which represents NC. At a measurement frequency of 1000 kHz, the NC peak voltage, at temperatures up to 150 K, occurs at a voltage corresponding to the onset of stimulated emission. At 10 kHz, the NC is associated with non-radiative recombination. Above 150 K, non-radiative recombination plays a significant role which naturally leads to reduction of the laser efficiency.


Corresponding author: Gadi Eisenstein, Electrical and Computer Engineering Department and Russell Berrie Nanotechnology Institute, Technion, Haifa, 32000, Israel, E-mail:

Award Identifier / Grant number: 460/21

Acknowledgement

This work was partially supported by the Israeli Science Foundation under grant number 460/21.

  1. Author contributions: All the authors have accepted responsibility for the entire content of this submitted manuscript and approved submission.

  2. Research funding: None declared.

  3. Conflict of interest statement: The authors declare no conflicts of interest regarding this article.

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Received: 2022-11-06
Accepted: 2023-01-23
Published Online: 2023-01-31

© 2023 the author(s), published by De Gruyter, Berlin/Boston

This work is licensed under the Creative Commons Attribution 4.0 International License.

Articles in the same Issue

  1. Frontmatter
  2. Editorial
  3. Nanophotonics in support of Ukrainian Scientists
  4. Reviews
  5. Asymmetric transmission in nanophotonics
  6. Integrated circuits based on broadband pixel-array metasurfaces for generating data-carrying optical and THz orbital angular momentum beams
  7. Singular optics empowered by engineered optical materials
  8. Electrochemical photonics: a pathway towards electrovariable optical metamaterials
  9. Sustainable chemistry with plasmonic photocatalysts
  10. Perspectives
  11. Ukraine and singular optics
  12. Machine learning to optimize additive manufacturing for visible photonics
  13. Through thick and thin: how optical cavities control spin
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  19. On the relation between electrical and electro-optical properties of tunnelling injection quantum dot lasers
  20. On-chip multivariant COVID 19 photonic sensor based on silicon nitride double-microring resonators
  21. Nano-infrared imaging of metal insulator transition in few-layer 1T-TaS2
  22. Electrical generation of surface phonon polaritons
  23. Dynamic beam control based on electrically switchable nanogratings from conducting polymers
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