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Figures-of-Merit for Advanced Oxidation Technologies: A Comparison of Homogeneous UV/H2O2, Heterogeneous UV/TiO2 and Electron Beam Processes

  • James R. Bolton , Julio E. Valladares , John P. Zanin , William J. Cooper , Michael G. Nickelsen , David C. Kajdi , Waite and Charles N. Kurucz
Published/Copyright: January 26, 2017
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Abstract

Three Advanced Oxidation Technologies (UV/H2O2, UV/TiO2 and Electron Beam) have been evaluated using the Electrical Energy per Order (EE/O) figure-of-merit. These processes have been tested on two aqueous treatment systems: the bleaching of methylene blue and the decay of phenol. In general, as expected, for a given process, the EE/O increased as the concentration of the contaminant increased. However, when the three processes were compared for the same system at the same concentration, the EE/Os for the UV/H2O2 and Electron Beam processes were very similar, but the EE/O for the UV/TiO2 was much higher than that for the other two processes. The UV/H2O2 process has the disadvantage that there is an added cost of chemicals (principally H2O2) and the E-beam process has the disadvantage that there is a constant power required to run the apparatus even when the beam is off. Nevertheless, the UV/TiO2 system has an inferior performance relative to the other two processes; the principal reason is probably the low quantum yield (~0.04-0.08) for the generation of hydroxyl radicals on the surface of TiO2 particles.

Received: 1997-9-2
Accepted: 1997-11-9
Published Online: 2017-1-26
Published in Print: 1998-6-1

© 2017 by Walter de Gruyter Berlin/Boston

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