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Erratum to: Ultrafast Bessel beams: advanced tools for laser materials processing

This erratum corrects the original online version which can be found here: https://doi.org/10.1515/aot-2018-0009
  • Razvan Stoian EMAIL logo , Manoj K. Bhuyan , Guodong Zhang , Guanghua Cheng , Remy Meyer and Francois Courvoisier
Published/Copyright: May 9, 2019
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Erratum to: Razvan Stoian, Manoj K. Bhuyan, Guodong Zhang, Guanghua Cheng, Remy Meyer, and Francois Courvoisier. 2018. Ultrafast Bessel beams: advanced tools for laser materials processing. Advanced Optical Technologies. Volume 7, Issue 3, pages 165–174. (DOI:10.1515/aot-2018-0009):

In the online and the printed issue of Advanced Optical Technologies [1] an error in Figure 2 occurred. The scale in Figure 2A, D is 3 μm. The correct figure is published here.

Figure 2: Bessel beams interaction with transparent materials [61], [63]. (A) Input surface pattern generated by a singe shot tightly focused ultrashort (60 fs, 14 μJ) Bessel beam (θair=22°) on fused silica; scanning electron microscope (SEM) image. The Bessel ring pattern is recognizable. (B) A high aspect ratio structure in the form of a one-dimensional void in bulk fused silica generated by a single shot ps stretched low focused Bessel beam (2 ps, 26 μJ, θglass=4°), viewed as low refractive index domain by phase-contrast microscopy (PCM). (C) Positive refractive index engineering with multishot (n=500) ultrashort moderately focused Bessel beam (60 fs, 1 μJ, θglass=8°); PCM image [61]. Dark colors denote a positive index change and white colors a negative change, respectively. (D) Back surface (exit surface) nanoscale structure in fused silica induced by a single shot moderately-focused ps stretched laser pulse (5 ps, 14 μJ, θglass=8°); SEM image. (E) Nanoscale void in sapphire (140 fs, 2 μJ, θsapphire=15°) [62] drilled by a single laser pulse and viewed with SEM after FIB milling. The used energies correspond to fluence values in air (in the absence of nonlinear distortions) from several J/cm2 up to several tens of J/cm2. Laser direction is marked.
Figure 2:

Bessel beams interaction with transparent materials [61], [63]. (A) Input surface pattern generated by a singe shot tightly focused ultrashort (60 fs, 14 μJ) Bessel beam (θair=22°) on fused silica; scanning electron microscope (SEM) image. The Bessel ring pattern is recognizable. (B) A high aspect ratio structure in the form of a one-dimensional void in bulk fused silica generated by a single shot ps stretched low focused Bessel beam (2 ps, 26 μJ, θglass=4°), viewed as low refractive index domain by phase-contrast microscopy (PCM). (C) Positive refractive index engineering with multishot (n=500) ultrashort moderately focused Bessel beam (60 fs, 1 μJ, θglass=8°); PCM image [61]. Dark colors denote a positive index change and white colors a negative change, respectively. (D) Back surface (exit surface) nanoscale structure in fused silica induced by a single shot moderately-focused ps stretched laser pulse (5 ps, 14 μJ, θglass=8°); SEM image. (E) Nanoscale void in sapphire (140 fs, 2 μJ, θsapphire=15°) [62] drilled by a single laser pulse and viewed with SEM after FIB milling. The used energies correspond to fluence values in air (in the absence of nonlinear distortions) from several J/cm2 up to several tens of J/cm2. Laser direction is marked.

Reference

[1] R. Stoian, M. Bhuyan, G. Cheng, G. Zhang, R. Meyer, et al., Adv. Opt. Technol. 7, 165–174 (2018).10.1515/aot-2018-0009Search in Google Scholar

Published Online: 2019-05-09
Published in Print: 2019-12-18

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