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Practical optimization of a coating deposition process by application of hybrid monitoring strategies in an industrial production environment

  • Mario Held

    Mario Held was born in Hachenburg, Germany, on December 7, 1976. He received his graduate in Engineering and Business from University Siegen, Germany, in 2003. From 2004, he has worked as a development engineer for optical coatings at the BTE Bedamp-fungstechnik GmbH in Elsoff, Germany.

         , Steffen Wilbrandt

    Steffen Wilbrandt was born in Plauen, Germany on January 13, 1972. He finished his diploma thesis at the Physics Department of Chem-nitz University of Technology, Germany, in 1998. He received his PhD from Friedrich-Schiller-University in Jena, in 2006. From 2002, he has worked at the Optical Coating Department of Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena, Germany.

     EMAIL logo     , Olaf Stenzel

    Olaf Stenzel finished his diploma thesis in laser spectroscopy at the Physics Department of Moscow State University, Russia, in 1986. He received his PhD from Chemnitz University of Technology, Germany, in 1990 and habilitated there in 1999 in the field of optical proper-ties of heterogeneous optical coatings. From 2001, he has worked at the Optical Coating Department of Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena, Germany. He is the author of The Physics of Thin Film Optical Spectra: An Introduction, (Springer 2005).

         , Norbert Kaiser

    Norbert Kaiser received his Diplom Physiker in 1974, his Dr. rer. nat. in 1983 and his Dr. habil in 1999 from the University of Jena, Germany. He is the Professor for Physics and Technology of Thin Films at the Technical University Jena. He heads the Optical Thin Film Department and is the Vice Director of the Fraunhofer Institute for Applied Optics and Precision Engineering in Jena.

         and Andreas Tünnermann

    Andreas Tünnermann was born in Ahnsen, Germany on June 10, 1963. He received a Diploma and a PhD degree in Physics from the University of Hannover in 1988 and 1992, respectively. In 1997, he received a habilitation qualification. He was head of the Department of Development at the Laser Zentrum Hannover from 1992 to 1997. In the beginning of 1998, he joined the Friedrich-Schiller-University in Jena, Germany, as a Professor and Director of the Institute of Applied Physics. In 2003, he additionally became the Director of the Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena. He is a sought-after expert in the Optics and Photonics Industry. He is the founder and member of the Board of Directors of the industry-driven cluster OptoNet Jena, one of the most dynamic regional optics clusters in Europe.

    Andreas Tünnermann is a member of various societies, e.g., of the German Physical Society and the Optical Society of America. His research activities on Applied Quantum Electronics have been awarded, e.g., with the Gottfried-Wilhelm-Leibniz Award (2005).
Published/Copyright: November 29, 2012
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Advanced Optical Technologies
From the journal Advanced Optical Technologies Volume 2 Issue 2

Abstract

The applicability of broadband optical monitoring to an industrial optical coating production environment is investigated. Different monitoring strategies have been applied to the deposition of beamsplitters and longpass edge filters by electron beam evaporation without any plasma or ion assistance. While the shift and reproducibility in the optical constants were poorly specified, pure optical broadband monitoring of the coatings did not prove superior to traditional quartz crystal monitoring. On the contrary, the introduction of a hybrid monitoring strategy that combines quartz crystal and broadband optical monitoring led to significant improvements in the coating performance reproducibility compared to a pure quartz crystal monitoring approach. Accompanying computational manufacturing experiments performed for the beamsplitter design reveal the same trend.

Keywords: beamsplitter; electron beam evaporation; longpass filter; optical monitoring; quartz crystal monitoring; OCIS codes: 310.1860; 310.6860; 310.3840; 310.4165; 310.1620
Corresponding author: Steffen Wilbrandt, Fraunhofer IOF, Albert-Einstein-Str.7, D-07745 Jena, Germany

About the authors

Mario Held

Mario Held was born in Hachenburg, Germany, on December 7, 1976. He received his graduate in Engineering and Business from University Siegen, Germany, in 2003. From 2004, he has worked as a development engineer for optical coatings at the BTE Bedamp-fungstechnik GmbH in Elsoff, Germany.

Steffen Wilbrandt

Steffen Wilbrandt was born in Plauen, Germany on January 13, 1972. He finished his diploma thesis at the Physics Department of Chem-nitz University of Technology, Germany, in 1998. He received his PhD from Friedrich-Schiller-University in Jena, in 2006. From 2002, he has worked at the Optical Coating Department of Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena, Germany.

Olaf Stenzel

Olaf Stenzel finished his diploma thesis in laser spectroscopy at the Physics Department of Moscow State University, Russia, in 1986. He received his PhD from Chemnitz University of Technology, Germany, in 1990 and habilitated there in 1999 in the field of optical proper-ties of heterogeneous optical coatings. From 2001, he has worked at the Optical Coating Department of Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena, Germany. He is the author of The Physics of Thin Film Optical Spectra: An Introduction, (Springer 2005).

Norbert Kaiser

Norbert Kaiser received his Diplom Physiker in 1974, his Dr. rer. nat. in 1983 and his Dr. habil in 1999 from the University of Jena, Germany. He is the Professor for Physics and Technology of Thin Films at the Technical University Jena. He heads the Optical Thin Film Department and is the Vice Director of the Fraunhofer Institute for Applied Optics and Precision Engineering in Jena.

Andreas Tünnermann

Andreas Tünnermann was born in Ahnsen, Germany on June 10, 1963. He received a Diploma and a PhD degree in Physics from the University of Hannover in 1988 and 1992, respectively. In 1997, he received a habilitation qualification. He was head of the Department of Development at the Laser Zentrum Hannover from 1992 to 1997. In the beginning of 1998, he joined the Friedrich-Schiller-University in Jena, Germany, as a Professor and Director of the Institute of Applied Physics. In 2003, he additionally became the Director of the Fraunhofer Institute for Applied Optics and Precision Engineering IOF in Jena. He is a sought-after expert in the Optics and Photonics Industry. He is the founder and member of the Board of Directors of the industry-driven cluster OptoNet Jena, one of the most dynamic regional optics clusters in Europe.

Andreas Tünnermann is a member of various societies, e.g., of the German Physical Society and the Optical Society of America. His research activities on Applied Quantum Electronics have been awarded, e.g., with the Gottfried-Wilhelm-Leibniz Award (2005).

The presented work has been done in the framework of the TACo project. The authors gratefully acknowledge the Federal Ministry of Economics and Technology (BMWi) for the financial support in terms of grant 16IN0408. M. Held expresses his thanks to the ABBE school of photonics, FSU Jena, Germany, for providing an academic host for this study.

References

[1] H. A. Macleod, Opt. Acta 19, 1–28 (1972).Search in Google Scholar

[2] P. Bousquet, A. Fornier, R. Kowalczyk, E. Pelletier and P. Roche, Thin Solid Films 13, 285–290 (1972).10.1016/0040-6090(72)90297-0Search in Google Scholar

[3] B. Vidal and E. Pelletier, Appl. Opt. 18, 3857–3862 (1979).Search in Google Scholar

[4] B. T. Sullivan, “An overview of optical monitoring techniques,” in Optical Interference Coatings Topical Meeting, 2010 OSA Technical Digest (Optical Society of America, 2010), paper TuC1.10.1364/OIC.2010.TuC1Search in Google Scholar

[5] H. Ehlers, S. Schlichting, C. Schmitz and D. Ristau, Proc. SPIE 8168, 81681F (2011); http://dx.doi.org/10.1117/12.898598.10.1117/12.898598Search in Google Scholar

[6] A. V. Tikhonravov and M. K. Trubetskov, Appl. Opt. 44, 6877–6884 (2005).Search in Google Scholar

[7] K. Friedrich, S. Wilbrandt, O. Stenzel, N. Kaiser and K. H. Hoffmann, Appl. Opt. 49, 3150–3162 (2010), http://dx.doi.org/10.1364/AO.49.003150.10.1364/AO.49.003150Search in Google Scholar PubMed

[8] A. V. Tikhonravov, M. K. Trubetskov and T. V. Amotchkina, Appl. Opt. 50, C111–C116 (2011), http://dx.doi.org/10.1364/AO.50.00C111.10.1364/AO.50.00C111Search in Google Scholar PubMed

[9] B. T. Sullivan and J. A. Dobrowolski, Appl. Opt. 31, 3821–3835 (1992).Search in Google Scholar

[10] B. T. Sullivan and J. A. Dobrowolski, Appl. Opt. 32, 2351–2360 (1993).Search in Google Scholar

[11] C. Holm, Appl. Opt. 18, 1978–1982 (1979), http://dx.doi.org/10.1364/AO.18.001978.10.1364/AO.18.001978Search in Google Scholar PubMed

[12] H. Ehlers, S. Schlichting, C. Schmitz and D. Ristau, “Hybrid Process Control for Precision Optics Enhanced by Computational Manufacturing”, in Optical Interference Coatings Topical Meeting, 2010 OSA Technical Digest (Optical Society of America, 2010), paper TuC6.10.1364/OIC.2010.TuC6Search in Google Scholar

[13] O. Züger, “Dielectric filter production with in situ broadband optical monitoring”, in Optical Interference Coatings Topical Meeting, 2010 OSA Technical Digest (Optical Society of America, 2010), paper TuC4.10.1364/OIC.2010.TuC4Search in Google Scholar

[14] S. Wilbrandt, O. Stenzel and N. Kaiser, Opt. Ex. 18, 19732–19742 (2010), http://dx.doi.org/10.1364/OE.18.019732.10.1364/OE.18.019732Search in Google Scholar PubMed

[15] A. V. Tikhonravov, M. K. Trubetskov, M. A. Kokarev, T. V. Amotchkina, A. Duparré, et al., Appl. Opt. 41, 2555–2560 (2002), http://dx.doi.org/10.1364/AO.41.002555.10.1364/AO.41.002555Search in Google Scholar

[16] A. V. Tikhonravov, M. K. Trubetskov and T. V. Amotchkina, Appl. Opt. 45, 7026–7034 (2006), http://dx.doi.org/10.1364/AO.45.007026.10.1364/AO.45.007026Search in Google Scholar

[17] S. Wilbrandt, O. Stenzel, N. Kaiser, Proc. SPIE 7101, 71010D (2008), http://dx.doi.org/10.1117/12.797454.10.1117/12.797454Search in Google Scholar

[18] R. Willey, Appl. Opt. 47, C147–150 (2008).10.1364/AO.47.00C147Search in Google Scholar

[19] R. Willey, Appl. Opt. 48, 3277–3283 (2009).Search in Google Scholar

[20] R. Willey, Appl. Opt. 48, 4475–4482 (2009).Search in Google Scholar

[21] O. Stenzel, J. Phys. D: Appl. Phys. 42, 055312 (2009), http://dx.doi.org/10.1088/0022-3727/42/5/055312.10.1088/0022-3727/42/5/055312Search in Google Scholar

[22] B. Badoil, F. Lemarchand, M. Cathelinaud and M. Lequime, Appl. Opt. 46, 4294–4303 (2007), http://dx.doi.org/10.1364/AO.46.004294.10.1364/AO.46.004294Search in Google Scholar

[23] D. Ristau, H. Ehlers, T. Gross and M. Lappschies, Appl. Opt. 45, 1495–1501 (2006), http://dx.doi.org/10.1364/AO.45.001495.10.1364/AO.45.001495Search in Google Scholar

[24] A. Zöller, S. Beißwenger, R. Götzelmann, K. Matl, Proc. SPIE 2253, 394–402 (1994), http://dx.doi.org/10.1117/12.192112.10.1117/12.192112Search in Google Scholar

[25] A. V. Tikhonravov and M. K. Trubetskov, Proc. SPIE 5250, 406 (2004), http://dx.doi.org/10.1117/12.513379.10.1117/12.513379Search in Google Scholar

[26] O. Stenzel, S. Wilbrandt, K. Friedrich and N. Kaiser, Vakuum in Forschung und Praxis 21, 15–23 (2009), http://dx.doi.org/10.1002/vipr.200900396.10.1002/vipr.200900396Search in Google Scholar

[27] M. Fox, in ‘Oxford Master Series in Condensed Matter Physics’, Vol. 3 (Oxford University Press, New York, 2010), ISBN 9780199573363.Search in Google Scholar

[28] A. V. Tikhonravov, M. K. Trubetskov, Appl. Opt. 51, 7319–7332 (2012).Search in Google Scholar

[29] A. V. Tikhonravov, M. K. Trubetskov, T. V. Amotchkina and V. Pervak, Appl. Opt. 50, C141–C147 (2011), http://dx.doi.org/10.1364/AO.50.00C141.10.1364/AO.50.00C141Search in Google Scholar PubMed

[30] D. Poitras, J. A. Dobrowolski, Appl. Opt. 43, 1286–1295 (2004), http://dx.doi.org/10.1364/AO.43.001286.10.1364/AO.43.001286Search in Google Scholar

Received: 2012-10-17
Accepted: 2012-11-02
Published Online: 2012-11-29
Published in Print: 2013-04-01

©2013 by THOSS Media & De Gruyter Berlin Boston

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https://doi.org/10.1515/aot-2012-0062
Keywords for this article
beamsplitter; electron beam evaporation; longpass filter; optical monitoring; quartz crystal monitoring; OCIS codes: 310.1860; 310.6860; 310.3840; 310.4165; 310.1620

Articles in the same Issue

  1. Masthead
  2. Masthead
  3. Call for Papers
  4. AOT – Advanced Optical Technologies
  5. Community
  6. News from the European Optical Society
  7. Conference Notes
  8. Conference Calendar
  9. Topical Issue: Image Sensors and Cameras
  10. Editorial
  11. Image sensors and cameras
  12. Tutorials
  13. Camera-based driver assistance systems
  14. Review of up-to date digital cameras interfaces
  15. Review Article
  16. High dynamic range CMOS (HDRC) imagers for safety systems
  17. Research Articles
  18. Color sensitivity of the multi-exposure HDR imaging process
  19. Eight considerations when evaluating a smart camera
  20. Global shutter pixels with correlated double sampling for CMOS image sensors
  21. Research Article
  22. Practical optimization of a coating deposition process by application of hybrid monitoring strategies in an industrial production environment
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