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Chemistry of Atomic Layer Deposition
-
Seán Thomas Barry
Language:
English
Published/Copyright:
2022
About this book
This book will help chemists and non-chemists alike understand the fundamentals of surface chemistry and precursor design, and how these precursors drive the processes of atomic layer deposition, and how the surface-precursor interaction governs atomic layer deposition processes. The underlying principles in atomic layer deposition rely on the chemistry of a precursor with a surface.
- Covers the fundamental chemistry behind ALD.
- Main audience is engineers using ALD and graduate students across all disciplines.
- Written by one of the most prominent Canadian researchers in the field of ALD.
Author / Editor information
Seán Thomas Barry, Carleton University, Ottawa, Canada.
Topics
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Frontmatter
I -
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Foreword
VII -
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Contents
IX -
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Chapter 1 Introduction
1 -
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Chapter 2 Saturation
13 -
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Chapter 3 Ligands
27 -
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Chapter 4 Precursors
37 -
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Chapter 5 Thermolysis
53 -
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Chapter 6 Nucleation
65 -
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Chapter 7 ALD processes
73 -
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Chapter 8 MLD processes
85 -
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Chapter 9 ALE processes
95 -
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Index
103
Publishing information
Pages and Images/Illustrations in book
eBook published on:
November 8, 2021
eBook ISBN:
9783110712537
Paperback published on:
November 22, 2021
Paperback ISBN:
9783110712513
Pages and Images/Illustrations in book
Front matter:
8
Main content:
105
Illustrations:
5
Coloured Illustrations:
70
Tables:
20
Audience(s) for this book
For chemistry graduate students and engineers in thin film deposition.
Safety & product resources
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Manufacturer information:
Walter de Gruyter GmbH
Genthiner Straße 13
10785 Berlin
productsafety@degruyterbrill.com
