"Simple" diagnostics for characterization of low-pressure chemically active plasmas

Articles in the same Issue

1. Energy transfers by long-lived species in glows and afterglows
2. New approaches in thermal plasma technology
3. Nonequilibrium discharges in air and nitrogen plasmas at atmospheric pressure
4. Plasma sterilization. Methods and mechanisms
5. Plasma production of nanocrystalline silicon particles and polymorphous silicon thin films for large-area electronic devices
6. Plasma processing and chemistry
7. Study for plasma etching of dielectric film in semiconductor device manufacturing. Review of ASET research project
8. Diagnostics of etching plasmas
9. Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas
10. Diagnostics and insights on PECVD for gas-barrier coatings
11. Plasma-assisted production of hydrogen from hydrocarbons
12. Ion-induced damage and annealing of silicon. Molecular dynamics simulations
13. Plasma treatment of textile fibers
14. Generation of thermal plasmas in liquid-stabilized and hybrid dc-arc torches
15. Nonthermal and nonequilibrium effects in high-power pulsed ICP and application to surface modification of materials
16. Splat formation in plasma-spray coating process
17. Ultrashort pulsed barrier discharges and applications
18. "Simple" diagnostics for characterization of low-pressure chemically active plasmas
19. Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR
20. Excilamps as efficient UV­VUV light sources
21. Plasma synthesis of catalytic thin films
22. Superhard nanocomposite coatings. From basic science toward industrialization
23. Clustering phenomena in low-pressure reactive plasmas. Basis and applications
24. How to exploit ion-induced stress relaxation to grow thick c-BN films
25. Definitions of basic terms relating to polymer liquid crystals (IUPAC Recommendations 2001)
26. Provisional Nomenclature Recommendations