Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges

Articles in the same Issue

1. Plasma spraying and extractive metallurgy: comparisons between mathematical modelling and measurements and between application and development
2. Heat and momentum transfer to particles in thermal plasma flows
3. Progress in thermal plasma deposition of alloys and ceramic fine particles
4. Progress in the applications of plasma surface modifications and correlations with the chemical properties of the plasma phase
5. Basic ion reactions and kinetics in plasmas
6. Dissociation of molecules in plasma and gas: the energy
7. Basic mechanisms of energetic molecule ejection from surfaces
8. Elementary processes in plasma-surface interactions with emphasis on ions
9. Optical diagnostics of low pressure plasmas
10. Applications of plasma polymerization
11. Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
12. Review of plasma deposition applications: preparation of optical waveguides
13. On the plasmaphysics of plasma-etching
14. The inductively coupled R.F. (radio frequency) plasma
15. The corona discharge, its properties and specific uses