Article
Open Access
Limitations of Extreme Nonlinear Ultrafast Nanophotonics
-
Christian Kern
and
Christian Spielmann
Published/Copyright:
October 6, 2015
Received: 2014-11-28
Accepted: 2015-5-21
Published Online: 2015-10-6
Published in Print: 2015-1-1
© 2015
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Keywords for this article
high harmonic generation;
plasmonic field enhancement;
ultrafast nanophontonics;
damage threshold;
laser-induced damage;
electron beam lithography
Creative Commons
BY-NC-ND 3.0
Articles in the same Issue
- Review Article
- Ultrafast carrier dynamics in Landau-quantized graphene
- Research Articles
- Template-Guided Self-Assembly of Discrete Optoplasmonic Molecules and Extended Optoplasmonic Arrays
- A compact plasmonic MOS-based 2×2 electro-optic switch
- Colloidal Plasmonic Titanium Nitride Nanoparticles: Properties and Applications
- Review Articles
- State-of-the-art photodetectors for optoelectronic integration at telecommunication wavelength
- Limitations of Extreme Nonlinear Ultrafast Nanophotonics
- Research Article
- Propagation and survival of frequency-bin entangled photons in metallic nanostructures
- Review Article
- Ultrafast-laser-inscribed 3D integrated photonics: challenges and emerging applications
- Research Article
- Optical separation and controllable delivery of cells from particle and cell mixture
- Review Article
- Coupling between plasmonic films and nanostructures: from basics to applications
