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Plasma Chemistry

Published/Copyright: September 1, 2009
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Where 2B &Y|Announcements of conferences, symposia, workshops, meetings, and other upcoming activities.

Plasma Chemistry

The International Symposium on Plasma Chemistry (ISPC) is a bi-annual international conference with topics encompassing the entire spectrum of plasma chemistry and plasma processing science. The 2005 symposium will be held 7–12 August 2005 in Toronto, Ontario, Canada. It will include a plasma equipment exhibition and will be preceded by an industrial workshop (7 August 2005) and two IUPAC summer schools—one on low pressure and one on high pressure plasma processing of materials (4–6 August 2005).

The symposium will be organized around plenary lectures, invited and contributed oral presentations, poster sessions, and special and oral sessions. All areas of plasma processing will be covered—from thermal to non-equilibrium plasmas, as well as from fundamentals to applications and engineering.

Contributions are solicited in application areas such as biomaterials, environmental, waste treatment, protective coatings, dielectric barrier discharges, plasma coating, cutting/welding, microelectronics, and all other areas of modern plasma application.

An exhibit will be held during the conference. Companies interested in participating in the exhibit should consult the conference Web site.

In the area of professional recognition, three Best Paper Awards will be selected and presented to young scientists on the basis of the scientific relevance of their contribution. In addition, publisher Wiley-VCH will offer the “Plasma Processes and Polymers Award” to the best oral presentation, poster, or paper by a young researcher on behalf of the Journal of Plasma Processes and Polymers.

The Plasma Chemistry Award recognizes lifetime achievements in the area of plasma chemistry and plasma processing. The Board of Directors of the International Plasma Chemistry Society will select the winner of that award. Nominations should be

submitted to Board Chairman K. Tachibana

<tatibana@kuee.kyoto-u.ac.jp> of Kyoto University .

See Mark Your Calendar for contact information

www.ispc17.org

Published Online: 2009-09-01
Published in Print: 2005-03

© 2014 by Walter de Gruyter GmbH & Co.

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