Plasma and gaseous etching of compounds of Groups III-V

Articles in the same Issue

1. Control and diagnostics of reactive plasma by photochemical and photoionization techniques
2. Thermal plasma processing in the nineties
3. Plasma deposition and properties of composite metal/polymer and metal/hard carbon films
4. Industrial-worthy plasma torches: State-of-the-art
5. Plasma deposition of amorphous silicon films: an overview on some open questions
6. Mechanism of the ozone formations in a near liquid nitrogen temperature medium pressure glow discharge positive column
7. Particle heating in a thermal plasma
8. Impulse corona simulation for flue gas treatment
9. Diagnostics of thermal plasma
10. Inductively coupled plasmas in analytical atomic spectrometry: excitation mechanisms and analytical feasibilities
11. Plasma polymerization of unsaturated alcohols for deposition of hydrophilic thin film
12. Plasma and gaseous etching of compounds of Groups III-V
13. Processing of a thermal plasma flow in a tube
14. High Tc superconducting oxide films prepared by sputtering
15. Plasma reactors for process metallurgy applications
16. Pulse corona induced plasma chemical process: a horizon of new plasma chemical technologies
17. Amorphous Si and Si-based alloys from glow-discharge plasma
18. Behaviour of NOx in air-fed ozonizers
19. Excited states of plasmas for steel surface nitriding and TiN deposition
20. Mechanisms of decomposition of hydrocarbons in electrical discharges
21. Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films
22. Ionized cluster beam (ICB) deposition and processes
23. Expanding plasma used for plasma deposition
24. Arc discharge and electrode phenomena
25. Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films